1.

Conference Proceedings
Conference Proceedings
1. Thin film 193nm TNK measurement using multi-domain genetic algorithm (MDGA) with a combination of beam profile reflectometry (BPR), absolute ellipsometry (AE), and spectroscopic ellipsometry (SE)
Opsal, J.L. ; Leng, J. ; Ke, C.-M. ; Chen, P.-H. ; Chen, J.-H. ; Ku, Y.-C.
Pub. info.: Advanced characterization techniques for optics, semiconductors, and nanotechnologies : 3-5 August 2003, San Diego, California, USA.  pp.6-18,  2003.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5188
2.

Technical Paper
Technical Paper
2. MEASUREMENTS AND PREDICTIONS OF TURBULENCE GENERATION IN HOMOGENEOUS PARTICLE-LADEN FLOWS
Chen, J.-H. ; Faeth, G.M.
Pub. info.: AIAA paper.  pp.1-12,  2000.  American Institute of Aeronautics and Astronautics
Title of ser.: AIAA Paper : Aerospace Sciences Meeting and Exhibit
Ser. no.: 2000
3.

Technical Paper
Technical Paper
3. INTER-WAKE TURBULENCE PROPERTIES IN HOMOGENEOUS PARTICLE-LADEN FLOWS
Chen, J.-H. ; Faeth, G. M.
Pub. info.: AIAA paper.  pp.1-12,  1999.  American Institute of Aeronautics and Astronautics
Title of ser.: AIAA Paper : AIAA Fluid Dynamics Conference
Ser. no.: 1999
4.

Technical Paper
Technical Paper
4. Turbulence generation in homogeneous particle-laden flows
Chen, J.-H. ; Wu, J.-S. ; Faeth, G.M.
Pub. info.: AIAA paper.  pp.1-18,  1998.  American Institute of Aeronautics and Astronautics
Title of ser.: AIAA Paper : Aerospace Sciences Meeting and Exhibit
Ser. no.: 1998
5.

Conference Proceedings
Conference Proceedings
5. 3-port polarization-independent optical quasi-circulator with holographic spatial walk-off polarizers
Chen, J.-H. ; Chen, K.-H. ; Hsieh, P.-J. ; Su, D.-C.
Pub. info.: Reliability of Optical Fiber Components, Devices, Systems, and Networks II.  pp.260-267,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5465
6.

Conference Proceedings
Conference Proceedings
6. Defect printability analysis study using virtual stepper system in a production environment
Chiou, S.Y. ; Lei, H. ; Liu, W.J. ; Chu, M.J. ; Chiang, D. ; Tuan, S. ; Hong, C.-L. ; Chang, M. ; Chen, J.-H. ; Chan, K.K. ; Qian, Q.-D. ; Cai, L. ; Pang, L.Y.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVI.  Part One  pp.23-34,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4689
7.

Conference Proceedings
Conference Proceedings
7. Automated defect severity analysis for binary and PSM mask defects
Cai, L. ; Chen, J.-H. ; Tu, L.-H. ; Chu, B. ; Chen, N. ; Fang, T.Y. ; Shieh, W.B.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part One  pp.253-262,  2002.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889
8.

Conference Proceedings
Conference Proceedings
8. Comparsion and correlation of VSS simulation results using images from different inspection systems
Hung, K. ; Lin, D. ; Chou, R.L. ; Yang, S.C. ; Lee, D. ; Tseng, A. ; Unno, H. ; Chen, J.-H. ; Huang, J. H.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology IX.  pp.666-672,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4754
9.

Conference Proceedings
Conference Proceedings
9. Defect dispositiong using mask printability analysis on alternating phase-shifting masks
Chang, C.-H. ; Hsieh, C.-H. ; Tzu, S.-D. ; Dai, C.-M. ; Lin, B. J. ; Pang, L. ; Qian, Q.-D. ; Chen, J.-H. ; Huang, J. H.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology IX.  pp.622-629,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4754
10.

Conference Proceedings
Conference Proceedings
10. 90-nm lithography process characterization using ODP scatterometry technology
Ke, C.-M. ; Yu, S.-S. ; Wang, Y.-H. ; Chou, Y.-J. ; Chen, J.-H. ; Lee, B.-H. ; Chu, H.-Y. ; Lin, H.-T. ; Gau, T.-S. ; Lin, C.-H. ; Ku, Y.-C. ; Lin, B.J. ; Huang, J. ; Hsu, J.J. ; Liu, V. ; Hetzer, D. ; Yap, L. ; Yang, W. ; Araki, K.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVIII.  pp.597-604,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5375