Chen, C.-J. ; Lai, S.-H. ; Lee, W.-H. ; Lin, C.-Y. ; Ku, T. ; Chen, C.-H. ; Chung, Y.-C.
Pub. info.:
Two- and three-dimensional methods for inspection and metrology III : 24-26 October, 2005, Boston, Massachusetts, USA. pp.600008-600008, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
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Proceedings of SPIE - the International Society for Optical Engineering
Application of synchrotron radiation techniques to materials science VI : symposium held April 16-20, 2001, San Francisco, California, U.S.A.. 2001. Warrendale, Penn.. Materials Research Society
Industrial and laboratory pyrolyses : symposiums sponsored by the Division of Industrial and Engineering Chemistry at the first Chemical Congress of the North American Continent, Mexico City, Mexico, Dec. 1-2, 1975, and by the Division of Petroleum Chemistry at the 169th meeting of the American Chemical Society, Philadelphia, Pa., April 7-8, 1975. pp.1-, 1976. Washington. American Chemical Society
Design, test, integration, and packaging of MEMS/MOEMS 2002 : 6-8 May, 2002, Cannes, France. pp.374-384, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Medical Imaging 2006: Ultrasonic Imaging and Signal Processing. pp.61470L-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Recent Developments in Traceable Dimensional Measurements II. pp.156-164, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Photomask and Next-Generation Lithography Mask Technology XI. pp.28-37, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Berger, L. ; Saule, W. ; Dress, P. ; Gairing, T.M. ; Chen, C.-J. ; Lee, H.-C. ; Hsieh, H.-C.
Pub. info.:
Photomask and Next-Generation Lithography Mask Technology XI. pp.148-154, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering