1.

Conference Proceedings
Conference Proceedings
1. Plasma etch of AZ5206/Cr and ZEP7000/Cr for 0.18- to 0.25-ｦﾌm-generation advanced mask fabrication
Tsai,W. ; Chen,F. ; Kamna,M. ; Chegwidden,S. ; Labovitz,S.M. ; Farnsworth,J.N. ; Dao,G.T.
Pub. info.: Photomask and X-Ray Mask Technology V.  pp.149-162,  1998.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3412
2.

Conference Proceedings
Conference Proceedings
2. Impact of the loading effect on CD control in plasma etching of Cr photomasks using ZEP 7000 resist
Chen,F. ; Tsai,W. ; Chegwidden,S. ; Yu,S. ; Kamna,M. ; Farnsworth,J.N. ; Coleman,T.P.
Pub. info.: 18th Annual BACUS Symposium on Photomask Technology and Management.  pp.429-437,  1998.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3546