Managing effects in CD control from PED and PEB in advanced DUV photomask manufacturing using FEP-171 resist
- Author(s):
Adisa Paulsson Kezhao Xing Hans Fosshaug Axel Lundvall Charles Bjoernberg Johan Karlsson - Publication title:
- Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5753(2)
- Pub. Year:
- 2005
- Pt.:
- 2
- Page(from):
- 1119
- Page(to):
- 1128
- Pages:
- 10
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819457332 [0819457337]
- Language:
- English
- Call no.:
- P63600/5753-2
- Type:
- Conference Proceedings
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