1.

Conference Proceedings
Conference Proceedings
1. Pose estimation in automatic object recognition
Chang,C.Y. ; Hoepner,R.
Pub. info.: Optical Pattern Recognition VII.  pp.233-240,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2752
2.

Conference Proceedings
Conference Proceedings
2. Mix-and-match lithography technology on 6-in.wafers for nanofabrication
Shy,S.L. ; Chao,T.S. ; Chu,C.H. ; Lei,T.F. ; Nakamura,K. ; Loong,W.A. ; Chang,C.Y.
Pub. info.: 15th Annual BACUS Symposium on Photomask Technology and Management.  pp.406-412,  1995.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2621
3.

Conference Proceedings
Conference Proceedings
3. Powerful inspection and metrology tool for micro-and nanofabrication
Shy,S.L. ; Lei,T.F. ; Nakamura,K. ; Loong,W.A. ; Chang,C.Y.
Pub. info.: 15th Annual BACUS Symposium on Photomask Technology and Management.  pp.413-422,  1995.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2621
4.

Conference Proceedings
Conference Proceedings
4. Effects of post-treatment for low-dielectric hydrogen silsesquioxane (HSQ)
Chang,T.C. ; Liu,P.T. ; Chou,M.F. ; Tsai,M.S. ; Sze,S.M. ; Chang,C.Y. ; Shih,F.Y. ; Huang,H.D.
Pub. info.: Multilevel Interconnect Technology II.  pp.208-215,  1998.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3508
5.

Conference Proceedings
Conference Proceedings
5. Application of direct-write electron-beam lithography for deep-submicron fabrication
Shy,S.L. ; Yew,J.Y. ; Nakamura,K. ; Chang,C.Y.
Pub. info.: 16th Annual BACUS Symposium on Photomask Technology and Management.  pp.334-343,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2884
6.

Conference Proceedings
Conference Proceedings
6. Conducting poly(aniline-co-N-propanesulfonic acid aniline)(PAPSAH)as charge dissipation layer for e-beam lithography
Shy,S.L. ; Chao,T.S. ; Lei,T.F. ; Chen,S.A. ; Loong,W.A. ; Chang,C.Y.
Pub. info.: 16th Annual BACUS Symposium on Photomask Technology and Management.  pp.454-465,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2884