1.

Conference Proceedings
Conference Proceedings
1. Effects of mask bias on the mask error enhancement factor (MEEF) for low k1 lithography process [5853-61]
Chang, Y. Y. ; Wu, Y.-H. ; Shih, C.-L. ; Lin, J. ; Kan, F. ; Lin, J.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.757-766,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853
2.

Conference Proceedings
Conference Proceedings
2. Model-based OPC for node random size contact hole with SRAF [6154-129]
Huang, C. W. ; Chang, Y. Y. ; Yeh, L. S. ; Liao, H. Y. ; Shih, C. L. ; Lin, J. P.
Pub. info.: Optical Microlithography XIX.  pp.61543C-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6154