1.

Conference Proceedings
Conference Proceedings
1. THE HIGH TEMPERATURE STABILITY AND RELAXATION OF UHV/CVD SiGe THIN FILMS
Stiffler, S.R. ; Stanis, C.L. ; Goorsky, M.S. ; Chan, K.K.
Pub. info.: Evolution of surface and thin film microstructure : symposium held November 30-December 4, 1992, Boston, Massachusetts, U.S.A..  pp.471-474,  1993.  Pittsburgh, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 280
2.

Conference Proceedings
Conference Proceedings
2. Material and Process Considerations of Ultra thin Silicon (Oxy) Nitride Films Grown on Silicon and SiO2 Surfaces
D'Emic, C.P. ; Gusev, E.P. ; Chan, K.K. ; Zabel, T. ; Copel, M. ; Murphy, R. ; Kozolowski, P. ; Newbury, J.
Pub. info.: Silicon Nitride and Silicon Dioxide Thin Insulating Films : proceedings of the sixth International Symposium.  pp.174-190,  2001.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2001-7
3.

Conference Proceedings
Conference Proceedings
3. CARBON-SILICON HETEROJUNCTION DIODES FORMED BY CH4/Ar RF PLASMA THIN FILM DEPOSITION ON Si SUBSTRATES
Amaratunga, G.A.J. ; Milne, W.I. ; Putnis, A. ; Chan, K.K. ; Clay, K.J. ; Welland, M.E.
Pub. info.: Diamond, silicon carbide, and related wide bandgap semiconductors : symposium held November 27-December 1, 1989, Boston, Massachusetts, U.S.A..  pp.377-382,  1990.  Pittsburgh, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 162
4.

Conference Proceedings
Conference Proceedings
4. HIGH-BANDGAP a-Si:H DEPOSITED BY CONCENTRIC-ELECTRODE RF GLOW DISCHARGE
Conde, J.P. ; Lau, F. ; Chu, V. ; Chan, K.K. ; Blum, J.M. ; Arienzo, M.
Pub. info.: Amorphous silicon technology, 1992.  pp.63-68,  1992.  Pittsburgh, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 258
5.

Conference Proceedings
Conference Proceedings
5. Concentration Dependence of Boron-Interstitial Cluster (BIC) Formation in Silicon-on-Insulator (SOI)
Saavedra, A.F. ; Jones, K.S. ; Radic, L. ; Law, M.E. ; Chan, K.K.
Pub. info.: Silicon front-end junction formation : physics and technology : symposium held April 13-15, 2004, San Francisco, California, U.S.A..  pp.357-362,  2004.  Warrendale, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 810
6.

Conference Proceedings
Conference Proceedings
6. A Self-Aligned Silicide Process Utilizing Ion Implants For Reduced Silicon Consumption And Control Of The Silicide Formation Temperature
Cohen, G.M. ; Cabral, C., Jr. ; Lavoie, C. ; Solomon, P.M. ; Guarini, K.W. ; Chan, K.K. ; Roy, R.A.
Pub. info.: Silicon materials - processing characterization and reliability : symposium held April 1-5, 2002, San Francisco, California, U.S.A..  pp.35-40,  2002.  Warrendale.  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 716
7.

Conference Proceedings
Conference Proceedings
7. A Self-Aligned Silicide Process for Thin Silicon-on-Insulator MOSFETs and Bulk MOSFETs With Shallow Junctions
Cohen, G.M. ; Cabral, C., Jr. ; Lavoie, C. ; Solomon, P.M. ; Guarini, K.W. ; Chan, K.K. ; Roy, R.A.
Pub. info.: Materials issues in novel si-based technology : symposium held November 26-28, 2001, Boston, Massachusetts, U.S.A..  pp.89-94,  2002.  Warrendale, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 686
8.

Conference Proceedings
Conference Proceedings
8. Thermal Stability of Strained Si on Relaxed Si1-xGex Buffer Layers
Mooney, P.M. ; Koester, S.J. ; Ott, J.A. ; Jordan-Sweet, J.L. ; Chu, J.O. ; Chan, K.K.
Pub. info.: Materials issues in novel si-based technology : symposium held November 26-28, 2001, Boston, Massachusetts, U.S.A..  pp.3-8,  2002.  Warrendale, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 686
9.

Technical Paper
Technical Paper
9. Genetic-Based Motion Planning For Articulated Robotic Manipulators
Chan, K.K. ; Zalzala, A.M.S.
Pub. info.: NASA Technical Reports.  pp.1-6,  1993.  National Aeronautics and Space Adminstration
10.

Conference Proceedings
Conference Proceedings
10. Photomask quality assessment strategy at 90-nm technology node with aerial image simulation
Nagamura, Y. ; Hosono, K. ; Pang, L. ; Chan, K.K. ; Tanaka, Y.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.476-483,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130