1.

Conference Proceedings
Conference Proceedings
1. Implementation of the ArF resists based on VEMA for sub-100-nm device
Kim, H.-W. ; Lee, S. ; Choi, S.-J. ; Lee, S.-H. ; Kang, Y. ; Woo, S.-G. ; Nam, D.S. ; Chae, Y.-S. ; Kim, J.S. ; Moon, J.-T. ; Kavanagh, R.J. ; Barclay, G.G.
Pub. info.: Advances in Resist Technology and Processing XIX.  Part One  pp.533-540,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4690
2.

Conference Proceedings
Conference Proceedings
2. Most feasible curing process for ArF resists in device integration aspect
Kim, H.-W. ; Kang, Y. ; Lee, J.-H. ; Chae, Y.-S. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S.
Pub. info.: Advances in Resist Technology and Processing XX.  2  pp.817-826,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5039