1.

Conference Proceedings
Conference Proceedings
1. Practicing extension of 248-nm DUV optical lithography using trim-mask PSM
Kling,M.E. ; Cave,N. ; Falch,B.J. ; Fu,C.-C. ; Green,K.G. ; Lucas,K.D. ; Roman,B.J. ; Reich,A.J. ; Sturtevant,J.L. ; Tian,R. ; Russell,D.R. ; Karklin,L. ; Wang,Y.-T.
Pub. info.: Optical microlithography XII : 17-19 March 1999, Santa Clara, California.  Part1  pp.10-17,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3679
2.

Conference Proceedings
Conference Proceedings
2. Theoretical and experimental optimization of numerical aperture and partial coherence for complementary phase-shift processes
Brodsky,C.J. ; Nelson-Thomas,C. ; Cave,N. ; Sturtevant,J.L.
Pub. info.: Optical Microlithography XIV.  4346  pp.755-761,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346
3.

Conference Proceedings
Conference Proceedings
3. Effects of complementary phase-shift imaging on gate CD control
Nelson-Thomas,C. ; Kling,M.E. ; Thompson,M.A. ; Wang,R. ; Cave,N. ; Fu,C.-C.
Pub. info.: Optical Microlithography XIV.  4346  pp.464-470,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346
4.

Conference Proceedings
Conference Proceedings
4. Experimental determination of the impact of polysilicon LER on sub-100-nm transistor performance
Patterson,K. ; Sturtevant,J.L. ; Alvis,J.R. ; Benavides,N. ; Bonser,D. ; Cave,N. ; Nelson-Thomas,C. ; Taylor,W.D. ; Turnquest,K.L.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XV.  pp.809-814,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4344
5.

Conference Proceedings
Conference Proceedings
5. Gate-Length-and threshold-voltage-dependent nonlinearity in the hot carrier DC Lifetime extrapolation for sub-100-nm NMOS devices
Chheda,S.N. ; Bhat,N. ; Tsui,P. ; Gonzales,S. ; Cave,N. ; Fu,C.-C. ; Huang,F. ; Nangia,A. ; Choi,P.S.-J. ; Collins,S.
Pub. info.: Microelectronic Device Technology III.  pp.175-185,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3881