1.

Conference Proceedings
Conference Proceedings
1. 0.11-μm imaging in KrF lithography using dipole illumination
Eurlings,M. ; Setten,E.van ; Torres,J.A. ; Dusa,M.V. ; Socha,R.J. ; Capodieci,L. ; Finders,J.
Pub. info.: Lithography for semiconductor manufacturing II : 30 May-1 June, 2001, Edinburgh, UK.  pp.266-278,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4404
2.

Conference Proceedings
Conference Proceedings
2. Optimal sampling strategies for sub-100-nm overlay
Rangarajan,B. ; Templeton,M.K. ; Capodieci,L. ; Subramanian,R. ; Scranton,A.
Pub. info.: Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, San Clara, California.  pp.348-359,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3332
3.

Conference Proceedings
Conference Proceedings
3. CD uniformity consideration for DUV step and scan tools
Seltmann,R. ; Minvielle,A.M. ; Spence,C.A. ; Muehle,S. ; Capodieci,L. ; Nguyen,K.B.
Pub. info.: Optical microlithography XII : 17-19 March 1999, Santa Clara, California.  Part1  pp.239-249,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3679
4.

Conference Proceedings
Conference Proceedings
4. Extending the limits of i-line lithography for via layers and minimization of dense-iso bias
Subramanian,R. ; Spence,C.A. ; Capodieci,L. ; Werner,T. ; Gallardo,E.
Pub. info.: Optical microlithography XII : 17-19 March 1999, Santa Clara, California.  Part2  pp.914-922,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3679
5.

Conference Proceedings
Conference Proceedings
5. Photoresist development modeling based on continuity equations
Zhu,Y. ; Capodieci,L. ; Cerrina,F.
Pub. info.: Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California.  pp.201-211,  1997.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3049
6.

Conference Proceedings
Conference Proceedings
6. Impact of coma on CD control for multiphase PSM designs
Schmidt,R.T. ; Spence,C.A. ; Capodieci,L. ; Krivokapic,Z. ; Geh,B. ; Flagello,D.G.
Pub. info.: Optical microlithography XI : 25-27 February 1998, Santa Clara, California.  pp.15-24,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3334
7.

Conference Proceedings
Conference Proceedings
7. Effects of advanced illumination schemes on design manufacturability and interactions with optical proximity corrections
Capodieci,L. ; Torres,J.A. ; Socha,R.J. ; Hollerbach,U. ; Chen,J.F. ; Os,C.van ; Granik,Yu. ; Toublan,O. ; Cobb,N.B.
Pub. info.: Challenges in process integration and device technology : 18-19 September 2000, Santa Clara, USA.  pp.58-67,  2000.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4181
8.

Conference Proceedings
Conference Proceedings
8. Forbidden pitches for 130-nm lithography and below
Socha,R.J. ; Dusa,M.V. ; Capodieci,L. ; Finders,J. ; Chen,J.F. ; Flagello,D.G. ; Cummings,K.D.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part2  pp.1140-1155,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
9.

Conference Proceedings
Conference Proceedings
9. Subresolution process windows and yield estimation technique based on detailed full-chip CD simulation
Granik,Yu. ; Cobb,N.B. ; Sahouria,E.Y. ; Toublan,O. ; Capodieci,L. ; Socha,R.J.
Pub. info.: Process Control and Diagnostics.  pp.335-341,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4182