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10 results

Conference Proceedings

1. polarization effects: EAPSM vs. TT EAPSM [6281-12]

Morgana, N. ; Conley, W. ; Cangemi, M. ; Cangemi, M. ; Kasprowicz, S. B.

Pub. info.:	EMLC 2006 : 22nd European Mask and Lithography Conference : 23-26 January 2006, Dresden, Germany. pp.628109-, 2006. Bellingham, Wash.,. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6281

Conference Proceedings

2. Manufacturability and printability of AAPSM with transparent etch stop layer [6281-54]

Cangemi, M. ; Philipsen, V. ; De Ruyter, R. ; Leunissen, L. ; Morgana, N. ; Sixt, P. ; Cangemi, M. ; Cottle, R. ; Kasprowicz, B.

Pub. info.:	EMLC 2006 : 22nd European Mask and Lithography Conference : 23-26 January 2006, Dresden, Germany. pp.62810T-, 2006. Bellingham, Wash.,. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6281

Conference Proceedings

3. Mask substrate birefringence requirements for hyper-NA lithography [6154-159]

van de Kerkhof, M. ; de Boeij, W. ; Demarteau, M. ; Geh, B. ; Leunissen, L. H. A. ; Martin, P. ; Cangemi, M.

Pub. info.:	Optical Microlithography XIX. pp.615444-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6154

Conference Proceedings

4. A films based approach to intensity imbalance correction for 65 nm node c:PSM [5992-19]

Cottle, R. ; Sixt, P. ; Lassiter, M. ; Cangemi, M. ; Martin, P. ; Progler, C.

Pub. info.:	25th Annual BACUS Symposium on Photomask Technology. pp.59920J-, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5992

Conference Proceedings

5. High transmission mask technology for 45nm node imaging [6154-38]

Conley, W. ; Morgana, N. ; Kasprowicz, B. S. ; Cangemi, M. ; Lassiter, M. ; Litt, L. C. ; Cangemi, M. ; Cottle, R. ; Wu, W. ; Cobb, J. ; Ham, Y. -M. ; Lucas, K. ; Roman, B. ; Progler, C.

Pub. info.:	Optical Microlithography XIX. pp.615411-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6154

Conference Proceedings

6. EMF simulation with DDM to enable EAPSM masks in 45nm manufacturing [6154-53]

Martin, P. M. ; Progler, C. J. ; Cangemi, M. ; Adam K ; Bailey G ; LaCour P

Pub. info.:	Optical Microlithography XIX. pp.61541G-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6154

Conference Proceedings

7. Feasibility study of embedded binary masks [6349-21]

Cangemi, M. ; Philipsen, V. ; Leunissen, L. H. A. ; Taylor, D.

Pub. info.:	Photomask Technology 2006. pp.63490L-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6349

Conference Proceedings

8. Improved prediction of across chip linewidth variation (ACLV) with photomask aerial image CD metrology [6349-23]

Poortinga, E. ; Zibold, A. ; Conley, W. ; Litt, L. C. ; Kasprowicz, B. ; Cangemi, M.

Pub. info.:	Photomask Technology 2006. pp.63490N-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6349

Conference Proceedings

9. AAPSM repair utilizing transparent etch stop layer

Taylor, D. ; Cangemi, M. ; Lassiter, M. ; Poortinga, E.

Pub. info.:	24th Annual BACUS Symposium on Photomask Technology. pp.477-485, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5567

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Conference Proceedings

10. Through-pitch characterization and printability for 65nm half-pitch alternating aperture phase shift applications [5853-108]

Philipsen, V. ; Leunissen, L. ; De Ruyter, R. ; Jonckheere, R. ; Marlin, P. ; Wakefield, C. ; Johnson, S. ; Cangemi, M. ; Buxbaum, A. ; Morrison, T.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology XII. pp.211-222, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5853

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Author: Cangemi, M.