1.

Conference Proceedings
Conference Proceedings
1. CD error sensitivity to "sub-killer" defects at k1 near 0.4:II
Nakagawa,K.H. ; Chen,J.F. ; Socha,R.J. ; Dusa,M.V. ; Laidig,T.L. ; Wampler,K.E. ; Caldwell,R.F. ; Broeke,D.J.van den
Pub. info.: 19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California.  Part2  pp.893-904,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3873
2.

Conference Proceedings
Conference Proceedings
2. Practical technology path to sub-0.10-ｦﾌm process generations via enhanced optical lithography
Chen,J.F. ; Laidig,T.L. ; Wampler,K.E. ; Caldwell,R.F. ; Nakagawa,K.H. ; Liebchen,A.
Pub. info.: 19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California.  Part2  pp.995-1016,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3873
3.

Conference Proceedings
Conference Proceedings
3. Design of 200-nm,170-nm,and 140-nm DUV contact sweeper high-transmission attenuating phase-shift mask:?.Experimental results
Socha,R.J. ; Shi,X. ; Holman,K.C. ; Dusa,M.V. ; Conley,W. ; Petersen,J.S. ; Chen,J.F. ; Laidig,T.L. ; Wampler,K.E. ; Caldwell,R.F. ; Chu,M.C. ; Su,C. ; Huang,K. ; Chen,C. ; Le,C. ; Pierrat,C. ; Su,B.
Pub. info.: Optical microlithography XII : 17-19 March 1999, Santa Clara, California.  Part1  pp.38-54,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3679
4.

Conference Proceedings
Conference Proceedings
4. Design and analysis of across-chip linewidth variation for printed features at 130 nm and below
Chen,J.F. ; Socha,R.J. ; Puntambekar,K. ; Wampler,K.E. ; Caldwell,R.F. ; Dusa,M.V. ; Love,J.C. ; Yeric,G. ; Stoner,B.
Pub. info.: Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California.  pp.168-177,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3998
5.

Conference Proceedings
Conference Proceedings
5. Manufacturing an advanced process characterization reticle incorporating halftone biasing
Nakagawa,K.H. ; Broeke,D.Van Den ; Chen,J.F. ; Laidig,T.L. ; Wampler,K.E. ; Caldwell,R.F.
Pub. info.: 15th European Conference on Mask Technology for Integrated Circuits and Microcomponents '98 : 16-17 November 1998, Munich-Unterhaching, Germany.  pp.129-134,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3665
6.

Conference Proceedings
Conference Proceedings
6. OPC technology road map to 0.14-ｦﾌm design rules
Chen,J.F. ; Laidig,L. ; Wampler,K.E. ; Caldwell,R.F. ; Naderi,A.R. ; Van Den Broeke,D.
Pub. info.: 17th Annual BACUS Symposium on Photomask Technology and Management.  pp.382-396,  1998.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3236
7.

Conference Proceedings
Conference Proceedings
7. Designing dual-trench alternating phase-shift masks for 140-nm and smaller features using 248-nm KrF and 193-nm ArF lithography
Petersen,J.S. ; Socha,R.J. ; Naderi,A.R. ; Baker,C.A. ; Rizvi,S.A. ; BanDenBroeke,D. ; Kachwala,N. ; Chen,F. ; Laiding,S. ; Wampler,K.E. ; Caldwell,R.F. ; Takeuchi,S. ; Yamada,Y. ; Senoh,T. ; McCallum,M.
Pub. info.: Photomask and X-Ray Mask Technology V.  pp.503-520,  1998.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3412
8.

Conference Proceedings
Conference Proceedings
8. Design of 200-nm,170-nm,and 140-nm DUV contact sweeper high-transmission attenuating phase-shift mask through simulation:I
Socha,R.J. ; Petersen,J.S. ; Chen,J.F. ; Laidig,T.L. ; Wampler,K.E. ; Caldwell,R.F.
Pub. info.: 18th Annual BACUS Symposium on Photomask Technology and Management.  pp.617-641,  1998.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3546
9.

Conference Proceedings
Conference Proceedings
9. Making high-performance scattering-bar OPC masks with vector-scan,variable-shaped e-beam,and raster-scan laser mask writers
Lu,H.H. ; Hwang,R. ; Lee,V. ; Chen,J.F. ; Laidig,T.L. ; Wampler,K.E. ; Caldwell,R.F.
Pub. info.: 18th Annual BACUS Symposium on Photomask Technology and Management.  pp.368-382,  1998.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3546
10.

Conference Proceedings
Conference Proceedings
10. Size matters:defect detectability in reticle and wafer inspection including advanced aerial image simulation for defect printability
Almog,E. ; Caldwell,R.F. ; Chang,F.-C. ; Chen,J.F. ; Farrar,N.R. ; Karklin,L. ; Laidig,T.L. ; Sabouri,S. ; Shen,W.P. ; Staud,W. ; Wu,C. ; Zelenko,J.
Pub. info.: 18th Annual BACUS Symposium on Photomask Technology and Management.  pp.139-144,  1998.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3546