1.

Conference Proceedings
Conference Proceedings
1. Feature level test patterns for characterizing residual process effects
Neureuther, A.R. ; McIntyre, G.R. ; Gennari, F.E. ; Lam, M. ; Cain, J.P. ; Robins, G.C. ; Huang, E. ; Choi, J. ; Wang, L. ; Yuan, L. ; Oshima, H.
Pub. info.: Design and process integration for microelectronic manufacturing II [sic] : 26-27 February 2004, Santa Clara, California, USA.  pp.76-84,  2004.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5379
2.

Conference Proceedings
Conference Proceedings
2. Optimum sampling for characterization of systematic variation in photolithography
Cain, J.P. ; Zhang, H. ; Spanos, C.J.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVI.  Part One  pp.430-442,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4689
3.

Conference Proceedings
Conference Proceedings
3. Compact formulation of mask error factor for critical dimension control in optical lithography
Zhang, H. ; Cain, J.P. ; Spanos, C.J.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVI.  Part One  pp.462-465,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4689
4.

Conference Proceedings
Conference Proceedings
4. Electrical linewidth metrology for systematic CD variation characterization and causal analysis
Cain, J.P. ; Spanos, C.J.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVII.  1  pp.350-361,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5038