1.

Conference Proceedings
Conference Proceedings
1. In Situ Analysis of the Formation of Thin TiSi2 (<50 nm) Contacts in Submicron CMOS Structures During Rapid Thermal Annealing
Clevenger, L. A. ; Cabral, C., Jr ; Roy, R. A. ; Lavoie, C. ; Viswanathan, R. ; Saenger, K. L. ; Jordan-Sweet, J. ; Morales, G. ; Ludwig, K. L., Jr ; Stephenson, G. B.
Pub. info.: Silicide thin films - fabrication, properties, and applications : Symposium held November 27-30, 1995, Boston, Massachusetts, USA.  pp.257-,  1996.  Pittsburgh.  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 402
2.

Conference Proceedings
Conference Proceedings
2. A Kinetic Study of the C49 to C54 Conversion in TiSi2 Using Electrical Resistivity Measurements on Single Sub-Micron Lines
Saenger, K. L. ; Cabral, C., Jr ; Clevenger, L. A. ; Roy, R. A.
Pub. info.: Silicide thin films - fabrication, properties, and applications : Symposium held November 27-30, 1995, Boston, Massachusetts, USA.  pp.275-,  1996.  Pittsburgh.  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 402
3.

Conference Proceedings
Conference Proceedings
3. Reduction of the C54-TiSi2 Phase Formation Temperature Using Metallic Impurities
Mann, R. W. ; Clevenger, L. A. ; Miles, G. L. ; Harper, J. M. E. ; Cabral, C., Jr ; d'Heurle, F. M. ; Knotts, T. A. ; Rakowski, D. W.
Pub. info.: Silicide thin films - fabrication, properties, and applications : Symposium held November 27-30, 1995, Boston, Massachusetts, USA.  pp.95-,  1996.  Pittsburgh.  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 402