1.

Conference Proceedings
Conference Proceedings
1. Formulation and modeling of dyed positive i-line resist for control of the reflective notching and CD variation
M. Plat ; W.R. Brunsvold ; R.S. Smith ; N.K. Eib ; C.F. Lyons
Pub. info.: Advances in resist technology and processing XII : 20-22 February 1995, Santa Clara, California.  pp.272-281,  1995.  Bellingham, WA.  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2438
2.

Conference Proceedings
Conference Proceedings
2. Improved resist profiles and CD control through optimized thin dielectric stacks
C.F. Lyons ; M. Agrawal ; B. Singh
Pub. info.: Advances in resist technology and processing XII : 20-22 February 1995, Santa Clara, California.  pp.583-598,  1995.  Bellingham, WA.  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2438