F. Ducroquet ; J. Hartmann ; C. Tabone ; D. Lafond ; C. Vizioz ; T. P. Ernst ; S. Deleonibus
Pub. info.:
Advanced gate stack, source/drain and channel engineering for Si-based CMOS 2: new materials, processes, and equipment. pp.333-342, 2006. Pennington, NJ. Electrochemical Society