1.

Conference Proceedings
Conference Proceedings
1. Carbon-rich cyclopolymers: their synthesis, etch resistance, and application to 193-nm microlithography
Pasini, D. ; Low, E. ; Meagley, R. P. ; Frechet, J. M. J. ; Willson, C. G. ; Byers, J. D.
Pub. info.: Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California.  pp.94-103,  1999.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3678
2.

Conference Proceedings
Conference Proceedings
2. Development of an incremental structural parameter model for predicting reactive ion etch rates of 193-nm photoresist polymer platforms
Wallow, T. I. ; Brock, P. J. ; DiPietro, R. A. ; Allen, R. D. ; Opitz, J. ; Sooriyakumaran, R. ; Hofer, D. C. ; Mewherter, A. M. ; Cui, Y. ; Yan, W. ; Worth, G. ; Moreau, W. M. ; Meute, J. ; Byers, J. D. ; Rich, G. K. ; McCallum, M. ; Jayaraman, S. ; Vicari, R. ; Cagle, J. ; Sun, S. ; Hullihen, K. A.
Pub. info.: Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California.  pp.26-35,  1999.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3678
3.

Conference Proceedings
Conference Proceedings
3. Block copolymers as additives: a route to enhanced resist performance
Sundararajan, N. ; Ogino, K. ; Valiyaveettil, S. ; Wang, J. ; Yang, S. ; Kameyama, A. ; Ober, C. K. ; Allen, R. D. ; Byers, J. D.
Pub. info.: Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California.  pp.78-85,  1999.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3678
4.

Conference Proceedings
Conference Proceedings
4. 193-nm single-layer process for 150-nm technology generation and below
Amblard, G. R. ; Zandbergen, P. ; McCallum, M. ; Stephen, A. ; Byers, J. D. ; Dean, K. R. ; Meute, J. ; Nelson, C. M.
Pub. info.: Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California.  pp.810-827,  1999.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3678
5.

Conference Proceedings
Conference Proceedings
5. Aberration retrieval for high-NA optical systems using the extended Nijboer-Zernike theory
Smith, M. D. ; Graves, T. ; Byers, J. D. ; Mack, C. A.
Pub. info.: Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA.  pp.262-273,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5754
6.

Conference Proceedings
Conference Proceedings
6. Methods for benchmarking photolithography simulators: Part III [5992-189]
Smith, M. D. ; Graves, T. ; Byers, J. D. ; Mack, C. A.
Pub. info.: 25th Annual BACUS Symposium on Photomask Technology.  pp.59925H-,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5992
7.

Conference Proceedings
Conference Proceedings
7. The impact of mask topography on binary reticles at the 65-nm node
Smith, M. D. ; Byers, J. D. ; Mack, C. A.
Pub. info.: 24th Annual BACUS Symposium on Photomask Technology.  pp.416-424,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5567