1.

Conference Proceedings
Conference Proceedings
1. Performance data of a variable transmission phase shifting mask blank for 193nm lithography enhanced by inspection contrast tuning [5963-19]
Becker, H. ; Renno, M. ; Hermanns, U. ; Seitz, H. ; Buttgereit, U. ; Knapp, K. ; Hess, G.
Pub. info.: Advances in optical thin films II : 13-15 September 2005, Jena, Germany.  pp.59630J-,  2005.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5963
2.

Conference Proceedings
Conference Proceedings
2. Production challenges of making EUV mask blanks
Seitz, H. ; Sobel, F. ; Renno, M. ; Leutbecher, T. ; Olschewski, N. ; Reichardt, T. ; Walter, R. ; Becker, H. ; Buttgereit, U. ; HeB, G. ; Knapp, K. ; Wies, C. ; Lebert, R.
Pub. info.: EMLC 2005 : 21st European Mask and Lithography Conference : 31 January-3 February, 2005, Dresden, Germany.  pp.244-251,  2005.  Bellingham, Wash.,.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5835
3.

Conference Proceedings
Conference Proceedings
3. Comparative study of bi-layer attenuating phase-shifting masks for hyper-NA lithography [6283-123]
Yoshizawa, M. ; Philipsen, V. ; Leunissen, A. H. L. ; Hendrickx, E. ; Jonckheere, R. ; Vandenberghe, G. ; Buttgereit, U. ; Becker, H. ; Koepernik, C. ; Irmscher, M.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XIII.  pp.62831G-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6283
4.

Conference Proceedings
Conference Proceedings
4. Extended process window using variable transmission PSM materials for 65 nm and 45 nm node [6283-120]
Koepernik, C. ; Becker, H. ; Brikner, R. ; Buttgereit, U. ; Irmscher, M. ; Nedelmann, L. ; Zibold, A.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XIII.  pp.62831D-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6283
5.

Conference Proceedings
Conference Proceedings
5. Antireflection solutions for next generation 193-nm binary and phase-shifting masks [5992-18]
Becker, H. ; Renno, M. ; Hermanns, U. ; Seitz, H. ; Buttgereit, U. ; Knapp, K. ; Hess, G.
Pub. info.: 25th Annual BACUS Symposium on Photomask Technology.  pp.59920I-,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5992
6.

Conference Proceedings
Conference Proceedings
6. Process window enhancement for 45-nm node using alterable transmission phase-shifting materials [6349-19]
Becker, H. ; Renno, M. ; Hess, G. ; Buttgereit, U. ; Koepernik, C. ; Nedelmann, L. ; Irmscher, M. ; Birkner, R. ; Zibold, A. ; Scheruebl, T.
Pub. info.: Photomask Technology 2006.  pp.63490J-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6349
7.

Conference Proceedings
Conference Proceedings
7. Determination of mask layer stress by placement metrology [5992-130]
Butschke, J. ; Buttgereit, U. ; Cotte, E. ; Hess, G. ; Irmscher, M. ; Seitz, H.
Pub. info.: 25th Annual BACUS Symposium on Photomask Technology.  pp.59923U-,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5992
8.

Conference Proceedings
Conference Proceedings
8. High-performance 6-in. EUV mask blanks produced under real production conditions by ion-beam sputter deposition
Becker, H.W. ; Sobel, F. ; Aschke, L. ; Renno, M. ; Krieger, J. ; Buttgereit, U. ; HeB, G. ; Lenzen, F. ; Knapp, K. ; Yulin, S.A. ; Feigl, T. ; Kuhlmann, T. ; Kaiser, N.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part One  pp.389-399,  2002.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889
9.

Conference Proceedings
Conference Proceedings
9. Back to square 9: a demonstration of 9-in. reticle capability
Cummings, K.D. ; Schneider-Stoermann, L.U. ; Buttgereit, U. ; Irmscher, M. ; Mueller, D. ; Hudek, P. ; Beyer, D. ; Brendel, B. ; Whittey, J.M. ; Eynon, B.G. ; Harsch, J. ; Constantine, C. ; Miller, K.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part One  pp.15-24,  2002.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889
10.

Conference Proceedings
Conference Proceedings
10. Development of a new PSM film system for 157-nm extensible to high-transmission 193 nm lithography
Becker, H.W. ; Chey, J. ; Sobel, F. ; Schmidt, F. ; Renno, M. ; Buttgereit, U. ; Angelopoulos, M. ; Hess, G. ; Knapp, K.
Pub. info.: 23rd Annual BACUS Symposium on Photomask Technology.  pp.204-212,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5256