1.

Conference Proceedings
Conference Proceedings
1. GAS-PHASE ETCHING OF SILICON OXiDE WITH ANHYDROUS HF AND ISOPROPANOL
Butterbaugh, J.W. ; Hiatt, C.F. ; Gray, D.C.
Pub. info.: Proceedings of the Third International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.374-383,  1994.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 1994-7
2.

Conference Proceedings
Conference Proceedings
2. SILICON CRITICAL CLEANING WITH OZONE, HF AND HCL IN A SPRAY PROCESSOR
Butterbaugh, J.W. ; Olson, E.D. ; Reaux, C.A.
Pub. info.: Cleaning technology in semiconductor device manufacturing : proceedings of the sixth international symposium.  pp.30-36,  1999.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 99-36
3.

Conference Proceedings
Conference Proceedings
3. METHOD FOR EVALUATION AND OPTIMIZATION OF PARTICLE REMOVAL PROCESSES
Narayanswami, N. ; Ruether, P.A. ; Thomes, G. ; Weygand, J.F. ; Lee, N.-P. ; Christenson, K.K. ; Butterbaugh, J.W. ; Hoo, S.H. ; Liu, B.Y.H.
Pub. info.: Cleaning technology in semiconductor device manufacturing : proceedings of the sixth international symposium.  pp.469-476,  1999.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 99-36
4.

Conference Proceedings
Conference Proceedings
4. YIELD ENHANCEMENT BY CRYOKINETIC CLEANING
Butterbaugh, J.W. ; Loper, S. ; Thomes, G.
Pub. info.: Cleaning technology in semiconductor device manufacturing : proceedings of the sixth international symposium.  pp.335-342,  1999.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 99-36