The Effect of Oxide Trenches on Defect Formation and Evolution in Ion-Implanted Silicon
- Author(s):
- Publication title:
- Silicon front-end junction formation : physics and technology : symposium held April 13-15, 2004, San Francisco, California, U.S.A.
- Title of ser.:
- Materials Research Society symposium proceedings
- Ser. no.:
- 810
- Pub. Year:
- 2004
- Page(from):
- 201
- Page(to):
- 208
- Pages:
- 8
- Pub. info.:
- Warrendale, Pa.: Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558997608 [1558997601]
- Language:
- English
- Call no.:
- M23500/810
- Type:
- Conference Proceedings
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