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14 results

Conference Proceedings

1. Reducing RIE Lag with Chemistry

Buie, M.J. ; Joshi, A.M. ; Regis, J.

Pub. info.:	Proceedings of the eleventh International Symposium on Plasma Processing. pp.469-479, 1996. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	96-12

Conference Proceedings

2. Loading and Scale-Up of Plasma Etching Reactors with More Complex Chemistries

Buie, M.J. ; Pender, J.T.P. ; Ventzek, P.L.J.

Pub. info.:	Proceedings of the Second International Symposium on Process Control, Diagnostics, and Modeling in Semiconductor Manufacturing. pp.317-324, 1997. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	97-9

Conference Proceedings

3. Surface Damage Characterization in a Magnetically Enhanced Reactive Ion Etcher

Buie, M.J. ; Vaidya, K.J. ; Sambei, T. ; Joshi, A.M.

Pub. info.:	Proceedings of the International Symposium on Thin Film Materials, Processes, Reliability, and Applications, Thin Film Processes. pp.167-174, 1997. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	97-30

Conference Proceedings

4. Optical emission endpoint optimization in the tetra etch chamber for production of embedded phase-shift photomasks

Brooks, C.B. ; Anderson, S. ; Anderson, R.B. ; Collard, C. ; Clevenger, J. ; Sandlin, N.L. ; Buie, M.J.

Pub. info.:	19th European Conference on Mask Technology for Integrated Circuits and Microcomponents. pp.235-243, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5148

Conference Proceedings

5. Effect of chamber seasoning on the chrome dry etch process

Clevenger, J.O. ; Buie, M.J. ; Sandlin, N.L.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology X. pp.92-100, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5130

Conference Proceedings

6. Improvement of chrome CDU by optimizing focus ring design

Anderson, R.B. ; Ruhl, G.G. ; Nesladek, P. ; Prechtl, G. ; Sabisch, W. ; Kersch, A. ; Buie, M.J.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology X. pp.264-274, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5130

Conference Proceedings

7. Advanced CD linearity improvement for multiproject wafers and SoC at 95-nm technology node

Lu, J. ; Sandlin, N.L. ; Sato, H. ; Lu, C. ; Cheng, N. ; Huang, T. ; Su, C. ; Buie, M.J.

Pub. info.:	22nd Annual BACUS Symposium on Photomask Technology. Part Two pp.800-808, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4889

Conference Proceedings

8. In-situ optical emission spectroscopic examination of chrome etch for photomasks

Anderson, R. ; Sandlin, N. ; Buie, M.J. ; Su, C. ; Agarwal, A. ; Brooks, C.J. ; Huang, Y.-C. ; Stoehr, B. C.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology IX. pp.312-322, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4754

Conference Proceedings

9. Process monitoring of etched fused silica phase-shift reticles

Brooks, C.B. ; Buie, M.J. ; Waheed, N.L. ; Martin, P.M. ; Walsh, P. ; Evans, G.

Pub. info.:	22nd Annual BACUS Symposium on Photomask Technology. Part One pp.25-31, 2002. Bellingham, WA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4889

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Conference Proceedings

10. Study of the role of Cl₂, O₂, and He in the chrome etch process with optical emission spectroscopy

Anderson, R.B. ; Ruhl, G. ; Sandlin, N.L. ; Buie, M.J.

Pub. info.:	22nd Annual BACUS Symposium on Photomask Technology. Part One pp.641-652, 2002. Bellingham, WA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4889

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Author: Buie, M.J.