Optical proximity effects and correction strategies for chemical-amplified DUV resists
- Author(s):
Beeck,M.Op de ( IMEC ) Bruggeman,B. Botermans,H. Driessche,V.Van Yen,A. Tritchkov,A. Jonckheere,R. Ronse,K. hove,L.Van den - Publication title:
- Optical Microlithography IX
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 2726
- Pub. Year:
- 1996
- Vol.:
- Part2
- Page(from):
- 622
- Page(to):
- 633
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819421029 [0819421022]
- Language:
- English
- Call no.:
- P63600/2726
- Type:
- Conference Proceedings
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