1.

Conference Proceedings
Conference Proceedings
1. Advanced optical imaging platform for CD metrology and defect review on 130-nm to 100-nm node reticles: and overview of preliminary results
Hourd, A.C. ; Grimshaw, A. ; Scheuring, G. ; Gittinger, C. ; Brueck, H.-J. ; Chen, S.-B. ; Chen, P.W. ; Hartmann, H. ; Ordynskyy, V. ; Jonckheere, R.M. ; Philipsen, V. ; Schaetz, T. ; Sommer, K.
Pub. info.: 18th European Conference on Mask Technology for Integrated Circuits and Microcomponents.  pp.168-174,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4764
2.

Conference Proceedings
Conference Proceedings
2. Implementation of 248-nm based CD metrology for advanced reticle production
Hourd, A.C. ; Grimshaw, A. ; Scheuring, G. ; Gittinger, C. ; Doebereiner, S. ; Hillmann, F. ; Brueck, H.-J. ; Hartmann, H. ; Ordynskyy, V. ; Peter, K. ; Chen, S.-B. ; Chen, P.W. ; Jonckheere, R.M. ; Philipsen, V. ; Schaetz, T. ; Sommer, K.
Pub. info.: 19th European Conference on Mask Technology for Integrated Circuits and Microcomponents.  pp.148-157,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5148
3.

Conference Proceedings
Conference Proceedings
3. Through-pellicle-capable DUV-based CD metrology on reticles for wafer fab and R&D environment
Jonckheere, R.M. ; Philipsen, V. ; Scheuring, G. ; Hillmann, F. ; Brueck, H.-J. ; Ordynskyy, V. ; Peter, K. ; Hourd, A.C. ; Schaetz, T. ; Chen, S.-B. ; Chen, P.W. ; Sommer, K.
Pub. info.: 19th European Conference on Mask Technology for Integrated Circuits and Microcomponents.  pp.158-168,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5148
4.

Conference Proceedings
Conference Proceedings
4. Development and characterization of new CD mask standards: a status report
Schaetz, T. ; Hauffe, B. ; Doebereiner, S. ; Brueck, H.-J. ; Brendel, B. ; Bettin, L. ; Roeth, K.-D. ; Steinberg, W. ; Speckbacher, P. ; Sedlmeier, W. ; Engel, T. ; Haessler-Grohne, W. ; Mirande, W. ; Bosse, H.
Pub. info.: 19th European Conference on Mask Technology for Integrated Circuits and Microcomponents.  pp.42-53,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5148
5.

Conference Proceedings
Conference Proceedings
5. Reliable subnanometer repeatability for CD metrology in a reticle production environment
Hourd, A.C. ; Grimshaw, A. ; Scheuring, G. ; Gittinger, C. ; Doebereiner, S. ; Hillmann, F. ; Brueck, H.-J. ; Chen, S.-B. ; Chen, P.W. ; Jonckheere, R.M. ; Philipsen, V. ; Hartmann, M. ; Ordynskyy, V. ; Peter, K. ; Schaetz,T. ; Sommer, K.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part One  pp.319-327,  2002.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889
6.

Conference Proceedings
Conference Proceedings
6. Mask error enhancement-factor (MEEF) metrology using automated scripts in CATS
van Adrichem, P.J.M. ; Driessen, F.A.J.M. ; van Hasselt, K. ; Brueck, H.-J.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part One  pp.551-557,  2002.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889