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Cleaning technology in semiconductor device manufacturing VIII : proceedings of the international symposium. pp.93-99, 2003. Pennington, NJ. Electrochemical Society
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Proceedings of the Symposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films. pp.20-33, 1997. Pennington, New Jersey. Electrochemical Society
Rapid thermal and other short-time processing technologies II : proceedings of the international symposium. pp.263-296, 2001. Pennington, NJ. Electrochemical Society
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Proceedings of the Symposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films. pp.88-98, 1997. Pennington, New Jersey. Electrochemical Society
Bersuker, G. ; Gilmer, M. ; Zeitzoff, P.M. ; Brown, G.A. ; Jackson, M.D. ; Shaapur, F. ; Foran, B. ; Huff, H.R.
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Low and high dielectric constant materials : materials science, processing, and reliability issues : proceedings of the fifth international symposium. pp.178-186, 2000. Pennington, N.J.. Electrochemical Society
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Integration of advanced micro- and nanoelectronic devices - critical issues and solutions : symposium held April 13-16, 2004, San Francisco, California, U.S.A.. pp.25-30, 2004. Warrendale, Pa.. Materials Research Society
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Integration of advanced micro- and nanoelectronic devices - critical issues and solutions : symposium held April 13-16, 2004, San Francisco, California, U.S.A.. pp.31-36, 2004. Warrendale, Pa.. Materials Research Society
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Integration of advanced micro- and nanoelectronic devices - critical issues and solutions : symposium held April 13-16, 2004, San Francisco, California, U.S.A.. pp.841-846, 2004. Warrendale, Pa.. Materials Research Society