1.

Conference Proceedings
Conference Proceedings
1. 33 ALD of Advanced High-k and Metal Gate Stacks for MOS Devices
Gutt, J. ; Gopalan, S. ; Brown, G. A. ; Kirsch, P. D. ; Peterson, J. J. ; Gardner, M. ; Li, H.-J. ; Lysaght, P. ; Alshareef, H. N. ; Choi, K. ; Huffman, C. ; Wen, H. C. ; Majhi, P. ; Lee, B. H. ; Chatham, H. ; Park, S. ; Lanee, S. ; Bartholomew, L. ; Senzaki, Y. (Invited Paper)
Pub. info.: Advanced gate stack, source/drain and channel engineering for Si-based CMOS, new materials, processes, and equipment : proceedings of the international symposium.  pp.282-292,  2005.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2005-05
2.

Conference Proceedings
Conference Proceedings
2. Experimental Observations of the Redistribution of Implanted Nitrogen at the Si-SiO2 Interface During RTA Processing
Lysaght, P. S. ; Nguyen, B. ; Bennett, J. ; Williamson, G. ; Torres, K. ; Gilmer, M. ; Luo, T-Y. ; Brady, D. ; Guan, J. ; Brown, G. A. ; Zeitzoff, P. ; Bersuker, G. ; Mucha, J. ; Geyling, F. ; Gebera, G. ; Vishnubhotla, L. ; Jackson, M. D. ; Huff, H. R.
Pub. info.: Si front-end processing - physics and technology of dopant-defect interactions : symposium held April 6-9, 1999, San Francisco, California, U.S.A..  pp.283-,  1999.  Warrendale, PA.  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 568
3.

Conference Proceedings
Conference Proceedings
3. Process and Manufacturing Challenges for High-K Gate Stack Systems
Gilmer, M. C. ; Luo, T-Y. ; Huff, H. R. ; Jackson, M. D. ; Kim, S. ; Bersuker, G. ; Zeitzoff, P. ; Vishnubhotla, L. ; Brown, G. A. ; Amos, R. ; Brady, D. ; Watt, V. H. C. ; Gale, G. ; Guan, J. ; Nguyen, B. ; Williamson, G. ; Lysaght, P. ; Torres, K. ; Geyling, F. ; Gondran, C. F. H.
Pub. info.: Ultrathin SiO[2] and high-K materials for USLI gate dielectrics : symposium held April 5-8, 1999, in San Francisco, California, U.S.A..  pp.323-,  1999.  Warrendale, PA.  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 567
4.

Conference Proceedings
Conference Proceedings
4. Electrical and physical characterization of ultrathin silicon oxynitride gate dielectric films formed by the jet vapor deposition technique
Karamcheti, A. ; Watt, V. H. C. ; Luo, T. Y. ; Brady, D. ; Shaapur, F. ; Vishnubhotla, L. ; Gale, G. ; Huff, H. R. ; Jackson, M. D. ; Torres, K. ; Diebold, A. ; Guan, J. ; Gilmer, M. C. ; Brown, G. A. ; Bersuker, G. ; Zeitzoff, P. ; Tamagawa, T. ; Guo, X. ; Wang, X. W. ; Ma, T. P.
Pub. info.: Structure and electronic properties of ultrathin dielectric films on silicon and related structures : symposium held November 29-December 1, 1999, Boston, Massachusetts, U.S.A..  pp.307-,  2000.  Warrendale, PA.  MRS-Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 592
5.

Conference Proceedings
Conference Proceedings
5. The Effect of Impurities in Thin Film When Used as MOS Gate Electrodes
Yang, H. ; Hu, J. C. ; Lu, J. P. ; Brown, G. A. ; Rotondara, A. L. P. ; Luttmer, J. D. ; Magel, L. K. ; Liu, H-Y. ; Chen, P. J.
Pub. info.: Advanced interconnects and contact materials and processes for future integrated circuits : symposium held April 13-16, 1998, San Francisco, California, U.S.A..  pp.343-,  1998.  Warrendale, Pa..  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 514
6.

Conference Proceedings
Conference Proceedings
6. Towards 0.5 nm EOT Scaling of HfO2/Metal Electrode Gate Stacks
Peterson, J. J. ; Brown, G. A. ; Matthews, K. ; Gutt, J. ; Gopalan, S. ; Li, H. -J. ; Kirsch, P. ; Barnett, J. ; Moumen, N. ; Huffman, C. ; Majhi, P. ; Chaudhary, N. ; Young, C. D. ; Sassman, B. ; Lee, B. -H. ; Ruelke, H. ; Schuehrer, H. ; Stephan, R. ; Wei, A. ; Werner, T. ; Wieczorek, K. ; Raab, M.
Pub. info.: Dielectrics for nanosystems: materials science, processing, reliability, and manufacturing : proceedings of the First international symposium.  pp.443-451,  2004.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2004-04
7.

Conference Proceedings
Conference Proceedings
7. Implications of Electronic and Ionic Conductivities of Polyimide Films in Integrated Circuit Fabrication
Brown, G. A.
Pub. info.: Polymer materials for electronic applications : based on a symposium sponsored by the Division of Organic Coatings and Plastics Chemistry at the second chemical congress of the North American continent (180th ACS national meeting), Las Vegas, Nevada, August 26-27, 1980.  pp.151-,  1982.  Washington, D.C..  American Chemical Society
Title of ser.: ACS symposium series
Ser. no.: 184