1.

Conference Proceedings
Conference Proceedings
1. UVIII-positive chemically amplified resist optimization
Rocque,J.M. ; Brooks,C.J. ; Henry,R.W. ; Benoit,D.E. ; Mangat,P.J.S.
Pub. info.: Emerging lithographic technologies II : 23-25 February 1998, Santa Clara, California.  pp.487-495,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3331
2.

Conference Proceedings
Conference Proceedings
2. Characterization of oxynitride hard mask removal processes for refractory x-ray mask fabrication
Brooks,C.J. ; Benoit,D.E. ; Racette,K.C. ; Puisto,D.M. ; Whig,R. ; Dauksher,W.J. ; Cummings,K.D.
Pub. info.: Emerging lithographic technologies II : 23-25 February 1998, Santa Clara, California.  pp.255-260,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3331
3.

Conference Proceedings
Conference Proceedings
3. Next-generation lithography mask development at the NGL Mask Center of Competency
Lercel,M.J. ; Brooks,C.J. ; Racette,K.C. ; Magg,C. ; Lawliss,M. ; Caldwell,N. ; Jeffer,R. ; Collins,K.W. ; Barrett,M. ; Nash,S.C. ; Trybendis,M.J. ; Bouchard,L.
Pub. info.: 19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California.  Part2  pp.804-813,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3873
4.

Conference Proceedings
Conference Proceedings
4. Imaging capabilities of proximity x-ray lithography at 70-nm ground rules
Krasnoperova,A.A. ; Rippstein,R.P. ; Flamholz,A.L. ; Kratschmer,E. ; Wind,S. ; Brooks,C.J. ; Lercel,M.J.
Pub. info.: Emerging lithographic technologies III : 15-17 March 1999, Santa Clara, California.  Part1  pp.24-39,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3676
5.

Conference Proceedings
Conference Proceedings
5. Advanced refractory-metal and process technology for the fabrication of x-ray masks
Brooks,C.J. ; Racette,K.C. ; Lercel,M.J. ; Powers,L.A. ; Benoit,D.E.
Pub. info.: Emerging lithographic technologies III : 15-17 March 1999, Santa Clara, California.  Part1  pp.14-23,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3676
6.

Conference Proceedings
Conference Proceedings
6. UVN2-negative chemically amplified resist optimization for x-ray mask fabrication
Rocque,J.M. ; Lercel,M.J. ; Brooks,C.J. ; Henry,R.W. ; Benoit,D.E.
Pub. info.: Emerging lithographic technologies III : 15-17 March 1999, Santa Clara, California.  Part1  pp.46-55,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3676
7.

Conference Proceedings
Conference Proceedings
7. Comparison of substrate curvature and resonant frequency thin film stress mapping techniques
Schlax,M.P. ; Engelstad,R.L. ; Lovell,E.G. ; Brooks,C.J. ; Magg,C.
Pub. info.: Emerging lithographic technologies IV : 28 February-1 March 2000, Santa Clara, USA.  pp.539-548,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3997
8.

Conference Proceedings
Conference Proceedings
8. Film stress changes during anodic bonding of NGL masks
Cotte,E.P. ; Schlax,M.P. ; Engelstad,R.L. ; Lovell,E.G. ; Brooks,C.J.
Pub. info.: Emerging lithographic technologies IV : 28 February-1 March 2000, Santa Clara, USA.  pp.515-524,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3997
9.

Conference Proceedings
Conference Proceedings
9. Predicting mechanical distortions in x-ray masks
Cotte,E.P. ; Engelstad,R.L. ; Lovell,E.G. ; Brooks,C.J.
Pub. info.: Emerging lithographic technologies III : 15-17 March 1999, Santa Clara, California.  Part2  pp.429-440,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3676