1.

Conference Proceedings
Conference Proceedings
1. 193-nm negative resist based on acid-catalyzed elimination of polar molecules
Sooriyakumaran, R. ; Davis, B.W. ; Larson, C.E. ; Brock, P.J. ; DiPietro, R.A. ; Wallow, T.I. ; Connor, E.F. ; Sundberg, L.K. ; Breyta, G. ; Allen, R.D. ; Patel, K.S. ; Varanasi, P.R.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.71-78,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376
2.

Conference Proceedings
Conference Proceedings
2. IBM-JSR 193-nm negative tone resist: polymer design, material properties, and lithographic performance
Patel, K.S. ; Lawson, M.C. ; Varanasi, P.R. ; Medeiros, D.R. ; Wallraff, G.M. ; Brock, P.J. ; DiPietro, R.A. ; Nishimura, Y. ; Chiba, T. ; Slezak, M.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.94-102,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376
3.

Conference Proceedings
Conference Proceedings
3. Aliphatic platforms for the design of 157-nm chemically amplified resists
Ito, H. ; Truong, H.D. ; Okazaki, M. ; Miller, D.C. ; Fender, N. ; Breyta, G. ; Brock, P.J. ; Wallraff, G.M. ; Larson, C.E. ; Allen, R.D.
Pub. info.: Advances in Resist Technology and Processing XIX.  Part One  pp.18-28,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4690
4.

Conference Proceedings
Conference Proceedings
4. Evolution of a 193-nm bilayer resist for manufacturing
Kwong, R.W. ; Khojasteh, M. ; Lawson, P. ; Hughes, T. ; Varanasi, P.R. ; Brunsvold, B. ; Allen, R.D. ; Brock, P.J. ; Sooriyakumaran, R. ; Truong, H.D. ; Mahorowala, A.P. ; Medeiros, D.R.
Pub. info.: Advances in Resist Technology and Processing XIX.  Part One  pp.403-409,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4690
5.

Conference Proceedings
Conference Proceedings
5. Optimized acid release underlayers for 157-nm lithography
Larson, C.E. ; Wallraff, G.M. ; Johnson, L. ; Brock, P.J. ; Sundberg, L.K.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.1174-1180,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376
6.

Conference Proceedings
Conference Proceedings
6. Highly etch-selective spin-on bottom antireflective coating for use in 193-nm lithography and beyond
Pfeiffer, D. ; Mahorowala, A.P. ; Babich, K. ; Medeiros, D.R. ; Petrillo, K.E. ; Angelopoulos, M. ; Huang, W.-S. ; Halle, S. ; Brodsky, C. ; Allen, S.D. ; Holmes, S.J. ; Kwong, R.W. ; Lang, R. ; Brock, P.J.
Pub. info.: Advances in Resist Technology and Processing XX.  1  pp.136-143,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5039