In-line TEM sample preparation and wafer return strategy for rapid yield learning [6152-81]
- Author(s):
Bicais-Lepinay, N. ( STMicroelectronics (France) ) Andre, F. ( STMicroelectronics (France) ) Brevers, S. ( STMicroelectronics (France) ) Guyader, P. ( STMicroelectronics (France) ) Trouiller, C. ( STMicroelectronics (France) ) Kwakman, L. F. Tz. ( Philips Semiconductors (France) ) Pokrant, S. ( Philips Semiconductors (France) ) Verkleij, D. ( FEI Co. (Netherlands) ) Schampers, R. ( FEI Co. (Netherlands) ) Ithier, L. ( STMicroelectrpronics (France) ) Sicurani, E. ( CEA-LETI (France) ) - Publication title:
- Metrology, Inspection, and Process Control for Microlithography XX
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6152
- Pub. Year:
- 2006
- Pt.:
- 1
- Page(from):
- 615217
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819461957 [0819461954]
- Language:
- English
- Call no.:
- P63600/6152
- Type:
- Conference Proceedings
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