1.

Conference Proceedings
Conference Proceedings
1. CD-SEM image acquisition effects on 193-nm resists line slimming
Sullivan, N.T. ; Mastovich, M.E. ; Bowdoin, S. ; Brandom, R.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVII.  1  pp.618-623,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5038
2.

Conference Proceedings
Conference Proceedings
2. 193-nm resist: ultralow voltage CD-SEM performance for sub-130-nm contact hole process
Ferri, J.E. ; Vieira, M. ; Reybrouck, M. ; Mastovich, M.E. ; Bowdoin, S. ; Brandom, R. ; Knutrud, P.C.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVII.  1  pp.608-617,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5038
3.

Conference Proceedings
Conference Proceedings
3. Web-based metrology performance diagnostics
Sundaram, G. ; Mastovich, M.E. ; Avidor, R. ; Remillard, J. ; Brandom, R.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVII.  2  pp.1203-1210,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5038
4.

Conference Proceedings
Conference Proceedings
4. Electron beam metrology of 193-nm resists at ultralow voltage
Sullivan, N.T. ; Dixson, R. ; Bunday, B.D. ; Mastovich, M.E. ; Knutrud, P.C. ; Fabre, P. ; Brandom, R.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVII.  1  pp.483-492,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5038