1.

Conference Proceedings
Conference Proceedings
1. 0.7-NADUV step-and-scan system for 150-nm imaging with improved overlay
Schoot,J.van ; Bornebroek,F. ; Suddendorf,M. ; Mulder,M. ; Spek,J.van der ; Stoeten,J. ; Hunter,A. ; Rummer,P.
Pub. info.: Optical microlithography XII : 17-19 March 1999, Santa Clara, California.  Part1  pp.448-463,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3679
2.

Conference Proceedings
Conference Proceedings
2. Overlay performance in advanced processes
Bornebroek,F. ; Burghoorn,J. ; Greeneich,J.S. ; Megens,H.J. ; Satriasaputra,D. ; Simons,G. ; Stalnaker,S. ; Koek,B.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part1  pp.520-531,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
3.

Conference Proceedings
Conference Proceedings
3. Advances in process overlay
Hinnen,P.C. ; Megens,H.J.L. ; Schaar,M.van der ; Haren,R.J.F.van ; Mos,E.C. ; Lalbahadoersing,S. ; Bornebroek,F. ; Laidler,D.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XV.  pp.114-126,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4344