1.

Conference Proceedings
Conference Proceedings
1. Characterization of a Single Wafer Multi-Chamber Clustered EPI System at Reduced Pressure
Borland, J. ; Carlson, D. ; Riggi, C. ; Florendo, L. ; Pohl, C. ; Gong, B. ; Hey, P.
Pub. info.: Proceedings of the Twelfth International Symposium on Chemical Vapor Deposition.  pp.147-155,  1993.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 1993-2
2.

Conference Proceedings
Conference Proceedings
2. Infusion Processing: An Alternative to Plasma Technology for Semiconductor Device Manufacturing (Invited paper)
Hautala, J. ; Skinner, W. ; Sherman, S. ; Shao, Y. ; Borland, J.
Pub. info.: ULSI Process Integration : proceedings of the International Symposium.  pp.118-132,  2005.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2005-06
3.

Conference Proceedings
Conference Proceedings
3. (11.5) 4:40 - 5:00 PM - Ge & Ge+B Infusion Doping and Deposition for Ultra-shallow Junction, Blanket and Localized SiGe or Ge Formation on Cz and SOI Wafers
Borland, J. ; Hautala, J. ; Tabat, M. ; Gwinn, M. ; Tetreault, T. ; Skinner, W.(J.O.B. Technologies)
Pub. info.: SiGe: materials, processing, and devices : proceedings of the First international symposium.  pp.769-784,  2004.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2004-07