1.

Conference Proceedings
Conference Proceedings
1. CD metrology for avoiding shrinkage of ArF resist patterns in 100-nm ArF lithography
You, T.-J. ; Bok, C.-K. ; Shin, K.-S.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVI.  Part Two  pp.724-732,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4689
2.

Conference Proceedings
Conference Proceedings
2. Limitation of optical lithography for various resolution enhancement technologies
Eom, T.-S. ; Ahn, C.-N. ; Park, D.-H. ; Koh, C.-W. ; Bok, C.-K.
Pub. info.: Optical Microlithography XV.  Part Two  pp.1575-1583,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
3.

Conference Proceedings
Conference Proceedings
3. Contact hole resolution enhancement by post exposure amine treatment (CONPEAT) process
Koh, C.-W. ; Kim, J.-S. ; Choi, C.-I. ; Eom, T.-S. ; Kwon, W.-T. ; Jung, J.-C. ; Bok, C.-K. ; Shin, K.-S.
Pub. info.: Advances in Resist Technology and Processing XIX.  Part Two  pp.793-798,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4690
4.

Conference Proceedings
Conference Proceedings
4. Printing 100-nm and sub-100-nm DRAM full-chip patterns with crosspole illumination in 0.63-NA ArF lithography
Kim, S.-K. ; Bok, C.-K. ; Shin, K.-S.
Pub. info.: Optical Microlithography XV.  Part Two  pp.1504-1512,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691