1.

Conference Proceedings
Conference Proceedings
1. Era of double exposure in 7O nm node DRAM cell
Lim, C.-M. ; Eom, T.-S. ; Kim, S.-M. ; Bok, C. ; Ma, W.-K. ; Park, G.-D. ; Moon, S.-C. ; Kim, J.-W.
Pub. info.: Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA.  pp.368-376,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5754
2.

Conference Proceedings
Conference Proceedings
2. Application of scatterometry to measure organic material profile [6152-110]
Koo, S. ; Ban, K. ; Lim. C. ; Bok, C. ; Moon, S. C. ; Kim. J.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XX.  pp.61522T-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6152
3.

Conference Proceedings
Conference Proceedings
3. Double exposure technology using silicon containing materials [6153-57]
Lee, S. ; Jung, J. ; Cho, S. ; Lim, C.-M. ; Bok, C. ; Kim, H. ; Moon, S. ; Kim, J.
Pub. info.: Advances in Resist Technology and Processing XXIII.  pp.61531K-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6153
4.

Conference Proceedings
Conference Proceedings
4. Rinse liquid to improve pattern collapse behavior
Lee, G. ; Lee, S.-K. ; Hwang, Y.-S. ; Jung, J.-C. ; Bok, C. ; Moon, S.-C. ; Shin, K.-S.
Pub. info.: Advances in Resist Technology and Processing XX.  2  pp.1416-1424,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5039