1.

Conference Proceedings
Conference Proceedings
1. Etch, reticle, and track CD fingerprint corrections with local dose compensation
van der Laan, H. ; Carpaij, R. ; Krist, J. ; Noordman, O. ; van Dommelen, Y. ; van Schoot, J. ; Blok, F. ; van Os, C. ; Stegeman, S. ; Hoogenboom, T. ; Hickman, C. ; Byers, E. ; Gugel, T.
Pub. info.: Data analysis and modeling for process control II : 3-4 March, 2005, San Jose, California, USA.  pp.107-118,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5755
2.

Conference Proceedings
Conference Proceedings
2. Total test repeatability: a new figure of merit for CD metrology tools
Cramer, H. ; Kiers, T. ; Vanoppen, P. ; Meessen, J. ; Blok, F. ; Dusa, M.V.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVIII.  pp.1254-1264,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5375
3.

Conference Proceedings
Conference Proceedings
3. CD uniformity improvement by active scanner corrections
van Schoot, J.B. ; Noordman, O. ; Vanoppen, P. ; Blok, F. ; Yim, D. ; Park, C.-H. ; Cho, B.-H. ; Theeuwes, T. ; Min, Y.-H.
Pub. info.: Optical Microlithography XV.  Part One  pp.304-314,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691