1.

Conference Proceedings
Conference Proceedings
1. pVD High-k Gate Dielectrics with FUSI Gate and Influence of PDA Treatment on On-State Drive Current
Niwa, M. ; Mitsuhashi, R. ; Yamamoto, K. ; Hayashi, S. ; Rothchild, A. ; Kubicek, S. ; De Gendt, S. ; Biesemans, S.
Pub. info.: Defects in high-κ gate dielectric stacks : nano-electronic semiconductor devices.  pp.1-17,  2006.  Dordrecht.  Springer
Title of ser.: NATO science series. Series 2, Mathematics, physics and chemistry
Ser. no.: 220
2.

Conference Proceedings
Conference Proceedings
2. Freeze-out Effects on the Characteristics of Deep Submicron Si MOSFETs in the 77 to 300 K Range
Croon, J. ; Biesemans, S. ; Kubicek, S. ; Simoen, E. ; De Meyer, K. ; Claeys, C.
Pub. info.: Proceedings of the fourth Symposium on Low Temperature Electronics and High Temperature Superconductivity.  pp.187-198,  1997.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 97-2
3.

Conference Proceedings
Conference Proceedings
3. 27 Materials Issues of Ni Fully Silicided (FUSI) Gates for CMOS Applications
Kittl, J. A. ; Lauwers, A. ; Pawlak, M. A. ; Demeurisse, C. ; Anil, K. G. ; Veloso, A. ; van Dal, M. J. H. ; Schram, T. ; Brijs, B. ; Kaiser, M. ; Kubicek, S. ; Cunniffe, J. ; Verbeeck, R. ; Vrancken, C. ; Biesemans, S. ; Maex, K.
Pub. info.: Advanced gate stack, source/drain and channel engineering for Si-based CMOS, new materials, processes, and equipment : proceedings of the international symposium.  pp.225-232,  2005.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2005-05
4.

Conference Proceedings
Conference Proceedings
4. High-k Dielectrics Integration Prospects (Invited paper)
Kubicek, S. ; Van Elshocht, S. ; Delabie, A. ; Yamamoto, K. ; Beckx, S. ; Claes, M. ; Van Hoornick, N. ; Kwak, D.-H. ; Hyun, S. ; Rothschild, A. ; Veloso, A. ; Anil, K. ; Lujan, G. ; Kittle, J.A. ; Lauwers, A. ; Kaushik, V. ; Niwa, M. ; De Gendt, S. ; Heyns, M. ; Jurczak, M. ; Biesemans, S.
Pub. info.: ULSI Process Integration : proceedings of the International Symposium.  pp.169-192,  2005.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2005-06
5.

Conference Proceedings
Conference Proceedings
5. 11 Real-Time Monitoring of Wet Chemical Oxidation and Etching Processes on Semiconductor Surfaces for Process Optimization and Waste Minimization
Okorn-Schmidt, H.F. ; Teerlinck, I. ; Biesemans, S. ; Heyns, M.M.
Pub. info.: Proceedings of the Symposium on Environmental Aspects of Electrochemical Technology: applications in electronics.  pp.140-158,  1996.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 96-21