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10 results

Conference Proceedings

1. Through-pitch low-k1 contact hole imaging with CPL technology

Wiaux, V. ; Bekaert, J. ; Chen, J.F. ; Hsu, S.D. ; Ronse, K.G. ; Socha, R.J. ; Vandenberghe, G. ; Van Den Broeke, D.J.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology XI. pp.585-594, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5446

Conference Proceedings

2. Printability study with polarisation capable AIMS fab 193i to study polarisation effects [6152-92]

Zibold, A. ; Stroessner, U. ; Ridley, A. ; Scherubl, T. ; Rosenkranz, N. ; Harnisch, W. ; Poortinga, E. ; Schmid, R. ; Bekaert, J. ; Philipsen, V. ; Van Look, L.

Pub. info.:	Metrology, Inspection, and Process Control for Microlithography XX. pp.61522F-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6152

Conference Proceedings

3. Experimental evaluation of bull’s-eye illumination for csslst-free random contact printing at sub-65nm node [6154-39]

Finders, J. ; Engelen, A. ; Vandenberghe, G. ; Bekaert, J. ; Chen, T.

Pub. info.:	Optical Microlithography XIX. pp.615412-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6154

Conference Proceedings

4. Compensating mask topography effects in CPL through-pitch solutions toward the 45nm node [5992-61]

Bekaert, J. ; Philipsen, V. ; Vandenberghe, G. ; van den Broeke, D. ; Degel, W. ; Zibold, A.

Pub. info.:	25th Annual BACUS Symposium on Photomask Technology. pp.59921O-, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5992

Conference Proceedings

5. Dynamic adaptation of multimedia data for mobile applications

De Sutter, R. ; Lerouge, S. ; Bekaert, J. ; Rogge, B. ; Van De Ville, D. ; Van de Walle, R.

Pub. info.:	Internet Multimedia Management Systems III. pp.240-248, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4862

Conference Proceedings

6. Metadata-based access to multimedia architectural and historical archive collections

Bekaert, J. ; Van De Ville, D. ; Rogge, B. ; Lerouge, S. ; De Sutter, R. ; De Kooning, E. ; Van de Walle, R.

Pub. info.:	Internet Multimedia Management Systems III. pp.22-29, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4862

Conference Proceedings

7. Analysis of multimedia formats for content description

Rogge, B. ; De Sutter, R. ; Bekaert, J. ; Van de Walle, R.

Pub. info.:	Internet Multimedia Management Systems III. pp.1-11, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4862

Conference Proceedings

8. Generic mapping mechanism between content description metadata and user enviroments

Lerouge, S. ; Rogge, B. ; De Sutter, R. ; Bekaert, J. ; Van De Ville, D. ; Van de Walle, R.

Pub. info.:	Internet Multimedia Management Systems III. pp.12-21, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4862

Conference Proceedings

9. Application challenges with double patterning technology (DPT) beyond 45 nm [6349-75]

Park, J. ; Hsu, S. ; Van Den Broeke, D. ; Chen, J. F. ; Dusa, M. ; Socha, R. ; Finders, J. ; Vleeming, B. ; van Oosten, A. ; Nikolsky, P. ; Wiaux, V. ; Hendrickx, E. ; Bekaert, J. ; Vandenberghe, G.

Pub. info.:	Photomask Technology 2006. pp.634922-634922, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6349

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Conference Proceedings

10. Mask topography effect in chromeless phase lithography

Philipsen, V. ; Bekaert, J. ; Vandenberghe, G. ; Jonckheere, R. ; Van Den Broeke, D. ; Socha, R.

Pub. info.:	24th Annual BACUS Symposium on Photomask Technology. pp.669-679, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5567

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Author: Bekaert, J.