Becker, G. ; Ross, M. F. ; Wong, S. S. ; Minter, J. P. ; Marlowe, T. ; Livesay, W. R.
Pub. info.:
Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California. pp.1126-1135, 1999. Bellingham, Wash., USA. SPIE - The International Society of Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Dolny, G. ; Ipri, A.C. ; Hsueh, F-L. ; Stewart, R.G. ; Atherton, J. ; Cuomo, F. ; Jose, D. ; Spitzer, M. ; Batty, D-P. VuM. ; Khormaei, R. ; Keyser, T. ; Becker, G. ; Tilton, M. ; Rhoades, R. ; Ellis, R. ; Franklin, H. ; Helgeson, M.
Pub. info.:
Proceedings of the Third International Symposium on Semiconductor Wafer Bonding : physics and applications. pp.426-433, 1995. Pennington, NJ. Electrochemical Society