1.

Conference Proceedings
Conference Proceedings
1. Multiple-stage optical proximity correction
Beale, D.F. ; Shiely, J.P. ; Rieger, M.L.
Pub. info.: Optical Microlithography XVI.  Part Two  pp.1202-1209,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
2.

Conference Proceedings
Conference Proceedings
2. Anticipating and controlling mask costs within EDA physical design (Invited Paper)
Rieger, M.L. ; Mayhew, J.P. ; Melvin, L.S. ; Lugg, R.M. ; Beale, D.F.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.617-627,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130
3.

Conference Proceedings
Conference Proceedings
3. Programmable RET mask layout verification
Beale, D.F. ; Mayhew, J.P, ; Rieger, M.L. ; Tang, Z.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part Two  pp.896-902,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889
4.

Conference Proceedings
Conference Proceedings
4. Enriching design intent for optimal OPC and RET
Rieger, M.L. ; Gravoulet, V. ; Mayhew, J.P. ; Beale, D.F. ; Lugg, R.M.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology IX.  pp.132-137,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4754
5.

Conference Proceedings
Conference Proceedings
5. Adaptive OPC with a conformal target layout
Lugg, R.M. ; Beale, D.F. ; Huang, J. ; Rieger, M.L.
Pub. info.: Optical Microlithography XV.  Part Two  pp.1091-1096,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
6.

Conference Proceedings
Conference Proceedings
6. Advanced model formulations for optical and process proximity correction
Beale, D.F. ; Shiely, J.P. ; Melvin, L.L., III ; Rieger, M.L.
Pub. info.: Optical Microlithography XVII.  pp.721-729,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377