1.

Conference Proceedings
Conference Proceedings
1. MOCVD of WN x Thin Films Using Novcl Imido Precursors
Johnston, S. ; Ortiz, C. ; Bchir, O. ; Zhang, Y.
Pub. info.: CVD XV, proceedings of the fifteenth International Symposium on Chemical Vapor Deposition.  pp.268-276,  2000.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2000-13
2.

Conference Proceedings
Conference Proceedings
2. MOCVD of Tungsten Nitride Thin Films from the Imido Complex Cl4(CH3CN)W(NiPr): Effect of NH3 on Film Properties
Bchir, O. ; Anderson, T. ; Brooks, B. ; McElwee-White, L.
Pub. info.: Chemical vapor deposition XVI and EUROCVD 14 : proceedings of the international symposium.  pp.424-431,  2003.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2003-8