Krug, C. ; Baumvol, I.J.R. ; Stedile, F.C. ; Green, M.L. ; Klemens, F. ; Silverman, P.J. ; Sorsch, T.W. ; Alvarez, F. ; Hammer, P. ; Victoria, N.M.
Pub. info.:
The physics and chemistry of SiO2 and the Si-SiO2 interface-4, 2000 : proceedings of the fourth International Symposium on the Physics and Chemistry of SiO2 and the Si-SiO2 Interface, Tronto, Canada, May 15-18, 2000. pp.187-198, 2000. Pennington, N.J.. Electrochemical Society
Stedile, F.C. ; Radtke, C. ; Baumvol, I.J.R. ; Boudinov, H. ; McDonald, K. ; Huang, M.B. ; Weller, R.A. ; Feldman, L.C. ; Williams, J.R.
Pub. info.:
The physics and chemistry of SiO2 and the Si-SiO2 interface-4, 2000 : proceedings of the fourth International Symposium on the Physics and Chemistry of SiO2 and the Si-SiO2 Interface, Tronto, Canada, May 15-18, 2000. pp.169-180, 2000. Pennington, N.J.. Electrochemical Society
Almeida, R.M.C. de ; Goncalves, S. ; Baumvol, I.J.R. ; Stedile, F.C.
Pub. info.:
The physics and chemistry of SiO2 and the Si-SiO2 interface-4, 2000 : proceedings of the fourth International Symposium on the Physics and Chemistry of SiO2 and the Si-SiO2 Interface, Tronto, Canada, May 15-18, 2000. pp.57-66, 2000. Pennington, N.J.. Electrochemical Society
Baumvol, I.J.R. ; Stedile, F.C. ; Morais, J. ; Krug, C. ; Radtke, C. ; da, Rosa ; E.B.O ; Bastos, K.P. ; Pezzi, R.P. ; Miotti, L. ; Soares, G.V.
Pub. info.:
Silicon nitride and silicon dioxide thin insulating films VII : proceedings of the international symposium. pp.106-118, 2003. Pennington, N.J.. Electrochemical Society
Baumvol, I.J.R. ; Breelle, E. ; Stedile, F.C. ; Ganem, J.-J. ; Trimaille, I. ; Rigo, S.
Pub. info.:
The physics and chemistry of SiO[2] and the Si-SiO[2] interface-3, 1996 : proceedings of the Third International Symposium on the Physics and Chemistry of SiO[2] and the Si-SiO[2] Interface. pp.97-108, 1996. Pennington, NJ. Electrochemical Society
Trimaille, I. ; Stedile, F.C. ; Ghanem, J.-J. ; Baumvol, I.J.R. ; Rigo, S.
Pub. info.:
The physics and chemistry of SiO[2] and the Si-SiO[2] interface-3, 1996 : proceedings of the Third International Symposium on the Physics and Chemistry of SiO[2] and the Si-SiO[2] Interface. pp.59-71, 1996. Pennington, NJ. Electrochemical Society
Gusev, E.P. ; Copel, M. ; Cartier, E. ; Buchanan, D. ; Okorn-Schmidt, H. ; Cribelyuk, M.A. ; Falcon, D. ; Murphy, R. ; Molis, S. ; Baumvol, I.J.R. ; Krug, C. ; Jussila, M. ; Tuominen, M. ; Haukka, S.
Pub. info.:
The physics and chemistry of SiO2 and the Si-SiO2 interface-4, 2000 : proceedings of the fourth International Symposium on the Physics and Chemistry of SiO2 and the Si-SiO2 Interface, Tronto, Canada, May 15-18, 2000. pp.477-486, 2000. Pennington, N.J.. Electrochemical Society