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Conference Proceedings
Conference Proceedings
1. CURING AND ALIGNMENT OF LIQUID CRYSTALLINE EPOXY NETWORKS
Ober, C.K. ; Barclay, G.G. ; Papathomas, K.I. ; Wang, D.W.
Pub. info.: Electronic packaging materials science V : symposium held November 26-29, 1990, Boston, Massachusetts, U.S.A..  pp.265-270,  1991.  Pittsburgh, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 203
2.

Conference Proceedings
Conference Proceedings
2. The effect of macromolecular architecture on the thin film aqueous base dissolution of phenolic polymers for microlithography
Barclay, G.G. ; King, M. ; Orellana, A. ; Malenfant, P.R.L. ; Sinta, R. ; Malmstrom, E. ; Ito, H. ; Hawker, C.J.
Pub. info.: Organic thin films : structure and applications.  pp.360-370,  1998.  Washington, DC.  American Chemical Society
Title of ser.: ACS symposium series
Ser. no.: 695
3.

Conference Proceedings
Conference Proceedings
3. The preparation and investigation of macromolecular architectures for microlithography by "living" free radical polymerization
Barclay, G.G. ; King, M. ; Orellana, A. ; Malenfant, P.R.L. ; Sinta, R. ; Malmstrom, E. ; Ito, H. ; Hawker, C.J.
Pub. info.: Micro- and nanopatterning polymers.  pp.144-160,  1998.  Washington, DC.  American Chemical Society
Title of ser.: ACS symposium series
Ser. no.: 706
4.

Conference Proceedings
Conference Proceedings
4. Why do weak acids not work in 193-nm photoresists?: matrix effects on acid-catalyzed deprotection
Pohlers, G. ; Barclay, G.G. ; Razvi, A. ; Stafford, C. ; Barbieri, A. ; Cameron, J.F.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.79-93,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376
5.

Conference Proceedings
Conference Proceedings
5. Implementation of the ArF resists based on VEMA for sub-100-nm device
Kim, H.-W. ; Lee, S. ; Choi, S.-J. ; Lee, S.-H. ; Kang, Y. ; Woo, S.-G. ; Nam, D.S. ; Chae, Y.-S. ; Kim, J.S. ; Moon, J.-T. ; Kavanagh, R.J. ; Barclay, G.G.
Pub. info.: Advances in Resist Technology and Processing XIX.  Part One  pp.533-540,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4690
6.

Conference Proceedings
Conference Proceedings
6. Subnanometer wavelength metrology of lithographically prepraed structures: a comparison of neutron and X-ray scattering.
Jones, R.L. ; Hu, T. ; Lin, E.K. ; Wu, W. ; Casa, D.M. ; Orji, N.G. ; Vorburger, T.V. ; Bolton, P.J. ; Barclay, G.G.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVII.  1  pp.191-199,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5038
7.

Conference Proceedings
Conference Proceedings
7. Structural characterizaton of deep-submicron lithographic structures using small-angle nentron scattering
Lin, E.K. ; Jones, R.L. ; Wu, W.-L. ; Barker, J.G. ; Bolton, P.J. ; Barclay, G.G.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVI.  Part One  pp.541-548,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4689
8.

Conference Proceedings
Conference Proceedings
8. Investigation of lithographic performance for 120-nm and sub-120-nm gate applications of advanced ArF resists based on VEMA co-polymers
Kavanagh, R.J. ; Orsula, G.W. ; Hellion, M. ; Barclay, G.G. ; Caporale, S. ; Pugliano, N. ; Thackeray, J.W. ; Mortini, B.P.
Pub. info.: Advances in Resist Technology and Processing XIX.  Part One  pp.141-149,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4690
9.

Conference Proceedings
Conference Proceedings
9. Bilayer technology for ArF and F2 lithography: the development of resists to minimize silicon outgassing
Barclay, G.G. ; Kanagasabapathy, S. ; Pohlers, G. ; Mattia, J. ; Xiong, K. ; Ablaza, S.L. ; Cameron, J. ; Zampini, T. ; Zhang, A. ; Yamada, S. ; Huby, F. ; Wiley, K.
Pub. info.: Advances in Resist Technology and Processing XX.  1  pp.433-441,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5039
10.

Conference Proceedings
Conference Proceedings
10. Negative tone 193-nm photoresists
Pugliano, N. ; Bolton, P.J. ; Barbieri, T. ; King, M. ; Reilly, M.T. ; Lawrence, W. ; Kang, D. ; Barclay, G.G.
Pub. info.: Advances in Resist Technology and Processing XX.  2  pp.698-704,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5039