1.

Conference Proceedings
Conference Proceedings
1. Critical procedure for OPC software benchmarking with maskshop consideration
Barberet,A. ; Galan,G. ; Fanget,G.L. ; Richoilley,J.-C. ; Tissier,M. ; Quere,Y.
Pub. info.: Lithography for semiconductor manufacturing II : 30 May-1 June, 2001, Edinburgh, UK.  pp.188-199,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4404
2.

Conference Proceedings
Conference Proceedings
2. Across field and across wafer flare:from KrF stepper to ArF scanner
Trouiller,Y. ; Luce,E. ; Barberet,A. ; Depre,L. ; Schiavone,P.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part2  pp.880-891,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
3.

Conference Proceedings
Conference Proceedings
3. Mask manufacturing contribution on 248-nm and 193-nm lithography performances
Barberet,A. ; Fanget,G.L. ; Richoilley,J.-C. ; Tissier,M. ; Quere,Y.
Pub. info.: 17th European Conference on Mask Technology for Integrated Circuits and Microcomponents.  pp.90-98,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4349
4.

Conference Proceedings
Conference Proceedings
4. 193-nm scanner characterization by SEM and electrical CD measurements
Pain,L. ; Trouiller,Y. ; Barberet,A. ; Guirimand,O. ; Fanget,G.L. ; Martin,N. ; Quere,Y. ; Nier,M.E. ; Lajoinie,E. ; Louis,D. ; Heitzmann,M. ; Scheiblin,P. ; Toffoli,A.
Pub. info.: Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California.  pp.96-107,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3998
5.

Conference Proceedings
Conference Proceedings
5. Mask manufacturing contribution on 248-nm and 193-nm lithography performances
Barberet,A. ; Fanget,G.L. ; Richoilley,J.-C. ; Tissier,M. ; Quere,Y.
Pub. info.: 20th Annual BACUS Symposium on Photomask Technology.  pp.902-910,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4186
6.

Conference Proceedings
Conference Proceedings
6. Adjustment of optical proximity correction (OPC) software for mask process correction (MPC). Module 1: Optical mask writing tool simulation
Barberet,A. ; Fanget,G.L. ; Buck,P.D. ; Toublan,O. ; Richoilley,J.-C. ; Tissier,M.
Pub. info.: 21st Annual BACUS Symposium on Photomask Technology.  4562  pp.511-521,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4562