1.

Conference Proceedings
Conference Proceedings
1. Impact of subwavelength CD tolerance of device performance
Balasinski, A. ; Karklin, L. ; Axelrad, V.
Pub. info.: Design, process integration, and characterization for microelectronics : 6-7 March 2002, Santa Clara, USA.  pp.361-368,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4692
2.

Conference Proceedings
Conference Proceedings
2. Charge Pumping Characterization of TFTs: The Effect of Hydrogen Annealing
Balasinski, A. ; Sundaresan, R. ; Hodges, R. ; Bryant, F. ; Huang, K.W. ; Worley, J. ; Liou, F.T.
Pub. info.: Proceedings of the Second Symposium on Thin Film Transistor Technologies.  pp.219-227,  1994.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 1994-35
3.

Conference Proceedings
Conference Proceedings
3. A 65-nm node SRAM solution using alt-PSM with ArF lithography
Driessen, F.A. ; Zawadzki, M.T. ; Krishnan, P.R. ; Balasinski, A. ; Vandenberghe, G.
Pub. info.: Design and process integration for microelectronic manufacturing II [sic] : 26-27 February 2004, Santa Clara, California, USA.  pp.224-234,  2004.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5379
4.

Conference Proceedings
Conference Proceedings
4. Optimization of interconnection layout for multitransistor cell shrinkability
Banachowicz, B. ; Pohland, O. ; Balasinski, A.
Pub. info.: Design and process integration for microelectronic manufacturing II [sic] : 26-27 February 2004, Santa Clara, California, USA.  pp.235-240,  2004.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5379
5.

Conference Proceedings
Conference Proceedings
5. A methodology to analyze circuit impact of process-related MOSFET geometry
Balasinski, A.
Pub. info.: Design and process integration for microelectronic manufacturing II [sic] : 26-27 February 2004, Santa Clara, California, USA.  pp.85-92,  2004.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5379
6.

Conference Proceedings
Conference Proceedings
6. Extending Standard Methods of Characterization to Very Thin Oxides
Balasinski, A. ; Ramkumar, K.
Pub. info.: The physics and chemistry of SiO2 and the Si-SiO2 interface-4, 2000 : proceedings of the fourth International Symposium on the Physics and Chemistry of SiO2 and the Si-SiO2 Interface, Tronto, Canada, May 15-18, 2000.  pp.443-452,  2000.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2000-2
7.

Conference Proceedings
Conference Proceedings
7. Multi-layer masks: manufacturability considerations [5853-49]
Balasinski, A.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.651-658,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853
8.

Conference Proceedings
Conference Proceedings
8. DfM requirements and ROI analysis for system-on-chip [5992-15]
Balasinski, A.
Pub. info.: 25th Annual BACUS Symposium on Photomask Technology.  pp.59920F-,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5992
9.

Conference Proceedings
Conference Proceedings
9. Inverse lithography technology: electrical verification of SRAM cell pattern [5992-101]
Balasinski, A. ; Moore, A. ; Shamma, N. ; Lin, T. ; Yang, H.
Pub. info.: 25th Annual BACUS Symposium on Photomask Technology.  pp.599230-599230,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5992
10.

Conference Proceedings
Conference Proceedings
10. Novel procedure for mask disposition electrical signatures of mask defects
Balasinski, A. ; Iandolo, W. ; Ray, O. ; Karklin, L. ; Axelrad, V.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology IX.  pp.606-613,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4754