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13 results

Conference Proceedings

1. DfM requirements and ROI analysis for system-on-chip [5992-15]

Balasinski, A.

Pub. info.:	25th Annual BACUS Symposium on Photomask Technology. pp.59920F-, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5992

Conference Proceedings

2. Multi-layer masks: manufacturability considerations [5853-49]

Balasinski, A.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology XII. pp.651-658, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5853

Conference Proceedings

3. Impact of subwavelength CD tolerance of device performance

Balasinski, A. ; Karklin, L. ; Axelrad, V.

Pub. info.:	Design, process integration, and characterization for microelectronics : 6-7 March 2002, Santa Clara, USA. pp.361-368, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4692

Conference Proceedings

4. Subwavelength lithography: an impact of photomask errors on cricuit performance

Karklin, L. ; Mazor, S. ; Joshi, D. ; Balasinski, A. ; Axelrad, V.

Pub. info.:	Optical Microlithography XV. Part One pp.259-267, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4691

Conference Proceedings

5. Novel procedure for mask disposition electrical signatures of mask defects

Balasinski, A. ; Iandolo, W. ; Ray, O. ; Karklin, L. ; Axelrad, V.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology IX. pp.606-613, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4754

Conference Proceedings

6. Inverse lithography technology: electrical verification of SRAM cell pattern [5992-101]

Balasinski, A. ; Moore, A. ; Shamma, N. ; Lin, T. ; Yang, H.

Pub. info.:	25th Annual BACUS Symposium on Photomask Technology. pp.599230-599230, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5992

Conference Proceedings

7. Mask complexity reduction, quality assurance, and yield improvement through reduced layout variability [6349-13]

Balasinski, A. ; Cetin, J.

Pub. info.:	Photomask Technology 2006. pp.63490D-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6349

Conference Proceedings

8. A procedure and program to calculate shuttle mask advantage [6349-164]

Balasinski, A. ; Cetin, J. ; Kahng, A. ; Xu, X.

Pub. info.:	Photomask Technology 2006. pp.63492B-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6349

Conference Proceedings

9. Charge Pumping Characterization of TFTs: The Effect of Hydrogen Annealing

Balasinski, A. ; Sundaresan, R. ; Hodges, R. ; Bryant, F. ; Huang, K.W. ; Worley, J. ; Liou, F.T.

Pub. info.:	Proceedings of the Second Symposium on Thin Film Transistor Technologies. pp.219-227, 1994. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	1994-35

10.

Conference Proceedings

10. A 65-nm node SRAM solution using alt-PSM with ArF lithography

Driessen, F.A. ; Zawadzki, M.T. ; Krishnan, P.R. ; Balasinski, A. ; Vandenberghe, G.

Pub. info.:	Design and process integration for microelectronic manufacturing II [sic] : 26-27 February 2004, Santa Clara, California, USA. pp.224-234, 2004. Bellingham, Wash., USA. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5379

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