1.

Conference Proceedings
Conference Proceedings
1. Device analysis: a way to reduce patterning cost at mask and wafer level?
Balasinski, A. P. ; Driessen, F. A.
Pub. info.: 24th Annual BACUS Symposium on Photomask Technology.  pp.147-154,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5567
2.

Conference Proceedings
Conference Proceedings
2. Multilayer and multiproduct masks: cost reduction methodology
Balasinski, A. P.
Pub. info.: 24th Annual BACUS Symposium on Photomask Technology.  pp.351-359,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5567