1.

Conference Proceedings
Conference Proceedings
1. Effect of PAC structure and resist morphology on the control of surface inhibition in positive photoresist systems
B.T. Beauchemin, Jr. ; R.J. Hurditch ; M.A. Toukhy ; A.J. Blakeney
Pub. info.: Advances in resist technology and processing XII : 20-22 February 1995, Santa Clara, California.  pp.282-293,  1995.  Bellingham, WA.  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2438
2.

Conference Proceedings
Conference Proceedings
2. Unique spin coat process for positive photoresists
D. Lyons ; B.T. Beauchemin, Jr. ; S. Garrard
Pub. info.: Advances in resist technology and processing XII : 20-22 February 1995, Santa Clara, California.  pp.726-736,  1995.  Bellingham, WA.  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2438