Dual-mask model-based proximity correction for high-performance 0.10-μm CMOS process
- Author(s):
Palmer,S.R. Mason,M.E. Randall,J.N. Aton,T. Kim,K. Tritchkov,A.V. Burdorf,J. Rieger,M.L. Stirniman,J.P. - Publication title:
- 20th Annual BACUS Symposium on Photomask Technology
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4186
- Pub. Year:
- 2000
- Page(from):
- 921
- Page(to):
- 932
- Pages:
- 12
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819438492 [0819438499]
- Language:
- English
- Call no.:
- P63600/4186
- Type:
- Conference Proceedings
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