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20 results

Conference Proceedings

1. Enhancing the development rate model in optical lithography simulation of ultrathick resist films for applications such as MEMS and LIGA

Arthur,G.G. ; Martin,B.

Pub. info.:	Lithography for semiconductor manufacturing II : 30 May-1 June, 2001, Edinburgh, UK. pp.209-220, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4404

Conference Proceedings

2. Modifying the surface inhibition layer of thick resists for improved process control

Arthur,G.G.

Pub. info.:	Lithography for semiconductor manufacturing II : 30 May-1 June, 2001, Edinburgh, UK. pp.372-379, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4404

Conference Proceedings

3. Definition and control of contact holes in a CMP process

Wallace,C. ; Martin,B. ; Arthur,G.G.

Pub. info.:	Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, San Clara, California. pp.594-602, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3332

Conference Proceedings

4. Comparison of recent development models in optical lithography simulation

Arthur,G.G. ; Wallace,C. ; Martin,B.

Pub. info.:	Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, San Clara, California. pp.538-549, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3332

Conference Proceedings

5. Improved simulation of photoresists using new development models

Dammel,R.R. ; Sagan,J.P. ; Kokinda,E. ; Eilbeck,N. ; Mack,C.A. ; Arthur,G.G. ; Henderson,C.L. ; Scheer,S.A. ; Rathsack,B.M. ; Willson,C.G.

Pub. info.:	Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California. Part 1 pp.401-416, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3333

Conference Proceedings

6. Enhancing the development-rate model for optimum simulation capability in the subhalf-micron regime

Arthur,G.G. ; Martin,B. ; Mack,C.A.

Pub. info.:	Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California. pp.189-200, 1997. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3049

Conference Proceedings

7. Effect of reticle manufacturing quality on full chip optical proximity correction

Martin,B. ; Arthur,G.G.

Pub. info.:	Lithography for semiconductor manufacturing : 19-21 May 1999, Edinburgh, Scotland. pp.197-201, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3741

Conference Proceedings

8. Effect of photoresist contrast on intrafield critical dimensions in sub-half-micron optical lithography

Wallace,C. ; Martin,B. ; Arthur,G.G.

Pub. info.:	Lithography for semiconductor manufacturing : 19-21 May 1999, Edinburgh, Scotland. pp.213-221, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3741

Conference Proceedings

9. Pitch-dependent intrafield dimensional offsets in advanced lithography

Wallace,C. ; Martin,B. ; Arthur,G.G.

Pub. info.:	Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California. pp.656-662, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3998

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Conference Proceedings

10. Metric for process optimization on substrates with transparent stacks in optical lithography

Martin,B. ; Arthur,G.G.

Pub. info.:	Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California. pp.641-647, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3998

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