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Resolution improvement of EPL stencil mask using thin membrane [6151-52]

Author(s):
Sugimura, H. ( Toppan Printing Co., Ltd. (Japan) )
Eguchi, H. ( Toppan Printing Co., Ltd. (Japan) )
Norimoto, M. ( Toppan Printing Co., Ltd. (Japan) )
Negishi, Y. ( Toppan Printing Co., Ltd. (Japan) )
Yonekura, I. ( Toppan Printing Co., Ltd. (Japan) )
Ito, K. ( Toppan Printing Co., Ltd. (Japan) )
Tamura, A. ( Toppan Printing Co., Ltd. (Japan) )
Koba, F. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
Arimoto, H ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
4 more
Publication title:
Emerging Lithographic Technologies X
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6151
Pub. Year:
2006
Pt.:
1
Page(from):
61511F
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819461940 [0819461946]
Language:
English
Call no.:
P63600/6151
Type:
Conference Proceedings

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