1.

Conference Proceedings
Conference Proceedings
1. Characterizing and understanding stray tilt: the next major contributor to CD SEM tool matching
Solecky, E.P. ; Archie, C.N. ; Mayer, J. ; Cornell, R.S. ; Adan, O.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVII.  1  pp.518-527,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5038
2.

Conference Proceedings
Conference Proceedings
2. New apparent beam width artifact and measurement methodology for CD-SEM resolution monitoring
Mayer, J.A. ; Huizenga, K.J. ; Solecky, E.P. ; Archie, C.N. ; Banke, G.W. Jr., ; Cogley, R.M. ; Nathan, C. ; Robert, J.M.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVII.  1  pp.699-710,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5038
3.

Conference Proceedings
Conference Proceedings
3. Improving sub-150-nm lithography and etch CD-SEM correlations to AFM and electrical test
Solecky, E.P. ; Mayer, J. ; Archie, C.N.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVI.  Part One  pp.473-483,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4689
4.

Conference Proceedings
Conference Proceedings
4. Feedforward of mask open measurements on an integrated scatterometer to improve gate linewidth control
Sendelbach, M. ; Natzle, W. ; Archie, C.N. ; Banke, B. ; Prager, D. ; Engelhard, D. ; Ferns, J. ; Yamashita, A. ; Funk, M. ; Higuchi, F. ; Tomoyasu, M.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVIII.  pp.686-702,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5375
5.

Conference Proceedings
Conference Proceedings
5. Correlating scatterometry to CD-SEM and electrical gate measurements at the 90-nm node using TMU analysis
Sendelbach, M. ; Archie, C.N. ; Banke, B. ; Mayer, J. ; Nii, H. ; Herrera, P. ; Hankinson, M.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVIII.  pp.550-563,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5375
6.

Conference Proceedings
Conference Proceedings
6. Reducing measurement uncertainty drives the use of multiple technologies for supporting metrology
Banke, B. ; Archie, C.N. ; Sendelbach, M. ; Robert, J. ; Slinkman, J.A. ; Kaszuba, P. ; Kontra, R. ; DeVries, M. ; Solecky, E.P.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVIII.  pp.133-150,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5375
7.

Conference Proceedings
Conference Proceedings
7. Total measurement uncertainty and total process precision evaluation of a structural metrology approach to monitoring post-CMP processes
Lu, W. ; Archie, C.N. ; Stone, S. ; Kang, H.H. ; Chitturi, P.R.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVIII.  pp.503-514,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5375
8.

Conference Proceedings
Conference Proceedings
8. Scatterometry measurement precision and accuracy below 70 nm
Sendelbach, M. ; Archie, C.N.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVII.  1  pp.224-238,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5038