1.

Conference Proceedings
Conference Proceedings
1. Advanced photomask repair technology for 65-nm lithography [6349-50]
Aramaki, F. ; Kozakai, T. ; Muramatsu, M. ; Sugiyama, Y. ; Koyama, Y. ; Matsuda, O. ; Suzuki, K. ; Okabe, M. ; Doi, T. ; Hagiwara, R. ; Adachi, T. ; Yasaka, A. ; Tanaka, Y. ; Suga, O ; Nishida, N.
Pub. info.: Photomask Technology 2006.  pp.63491E-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6349
2.

Conference Proceedings
Conference Proceedings
2. Advanced photomask repair technology for 65nm lithography (5) [6283-108]
Aramaki, F. ; Kozakai, T. ; Sugiyama, Y. ; Muramatsu, M. ; Koyama, Y. ; Matsuda, O. ; Suzuki, K. ; Okabe, M. ; Hagiwara, R. ; Yasaka, A. ; Adachi, T. ; Tanaka, Y. ; Suga, O. ; Nishida, N. ; Usui, Y.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XIII.  pp.628310-628310,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6283